Understanding and Tuning Mobile Interfaces in Ferroelectric Hf0.5Zr0.5O2 Thin Films in Relation to Microstructure

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Publication Details

Journal
Apollo (University of Cambridge)
Published
2025-08-20
Primary Topic
Ferroelectric and Negative Capacitance Devices
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article
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article

Understanding and Tuning Mobile Interfaces in Ferroelectric Hf0.5Zr0.5O2 Thin Films in Relation to Microstructure

Atif Jan, Nives Strkalj, Giuliana Di Martino, Ji Soo Kim et al.
Apollo (University of Cambridge)
Ferroelectric and Negative Capacitance Devices
article

Understanding and Tuning Mobile Interfaces in Ferroelectric Hf0.5Zr0.5O2 Thin Films in Relation to Microstructure

Atif Jan, Nives Strkalj, Giuliana Di Martino, Ji Soo Kim, Yoonsang Park, Duk‐Hyun Choe, Judith L. MacManus‐Driscoll, Benson K Tsai, Kihong Kim, Ping Lu, Maximilian T Becker, Haiyan Wang
article en

Abstract

No abstract available for this paper.
Apollo (University of Cambridge)
Openalex Percentile: Top 34%
Ferroelectric and Negative Capacitance Devices
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Understanding and Tuning Mobile Interfaces in Ferroelectric Hf0.5Zr0.5O2 Thin Films in Relation to Microstructure — Atif Jan, Nives Strkalj, et al. · Apollo (University of Cambridge) (2025) | TGRS Research Map | TGRS