Mitigating damage in GaN-based micro-LEDs by altering the sidewall crystal orientation via constructing hexagonal mesa structures
Size effects limit the application of GaN-based Micro-LEDs in advanced display technologies. To mitigate these size effects, a mesa-structured Micro-LED with a full m-faceted hexagonal facet is proposed, unlike the traditional square structure. Results show that, through the synergistic effect of crystal facet selection and structural optimization, the full m-plane hexagonal Micro-LED is less affected by dry etching and sidewalls, thus significantly improving its photoelectric properties. With decreasing size, the peak EQE of the hexagonal Micro-LED decreases from 15.95% to 14.76%, while the peak EQE of the square Micro-LED decreases from 15.67% to 13.96%. This work provides a new, to the best of our knowledge, fabrication process for suppressing size effects and developing small-sized, high-efficiency Micro-LEDs.
Authors
- Haowen Hua (ORCID: https://orcid.org/0009-0005-0482-794X)
- P. Zhang
- Jun Zhu (ORCID: https://orcid.org/0000-0002-1833-3917)
- Wenxian Yang (ORCID: https://orcid.org/0000-0002-1718-071X)
- Sicong Wang (ORCID: https://orcid.org/0009-0009-6779-5112)
- Shulong Lu
- Mengyang Huang
- Yi Gong
- Shibing Long
- Ying Gu
Institutions
- University of Science and Technology of China (CN)
Publication Details
- Journal
- Optics Letters
- Published
- 2026-03-02
- DOI
- https://doi.org/10.1364/ol.587823
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00