Formation of configurable uniform CdSeTe thin films by close-space sublimation deposition of multiple alternating CdSe and CdTe layers

Incorporation of selenium within cadmium telluride to form the CdSe<sub>x</sub>Te<sub>1-x</sub> alloy has enabled higher device efficiencies in photovoltaic applications through improved passivation and current collection. Recent investigations of this alloy have simultaneously indicated significant potential for further performance gains as well as potentially serious detrimental characteristics. Exploring how best to utilize this important material requires consistent, configurable film deposition. Absorber layers are often deposited by close-space sublimation, which can produce high-quality films at large scale. It has previously been demonstrated that close-space sublimation of CdSeTe material directly is inconvenient and inflexible; therefore, an alternative method with greater consistency and control over film composition is sought. In this work, CdSeTe films were formed by close-space sublimation of alternating CdSe and CdTe layers followed by a high-temperature annealing in the presence of CdCl<sub>2</sub>. Under the optimal deposition conditions, this technique was shown to produce high-quality films of CdSeTe with homogeneous elemental distribution, uniform grain size, and low roughness. However, this method also exhibited a significant tendency to form numerous voids which largely persist after CdCl<sub>2</sub> annealing. The source of this porosity was investigated and determined to primarily be resublimation of CdTe during the higher-temperature deposition of the CdSe layers. The process window to prevent voiding was observed to be rather small; while this would be a significant detriment in a production setting, it is less important in the targeted application for this approach, which is fundamental material and device investigations.

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Publication Details

Journal
Science and Technology of Advanced Materials
Published
2026-02-26
DOI
https://doi.org/10.1080/14686996.2026.2633815
Primary Topic
Chalcogenide Semiconductor Thin Films
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article
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article

Formation of configurable uniform CdSeTe thin films by close-space sublimation deposition of multiple alternating CdSe and CdTe layers

Robert Arndt, Pascal Jundt, Thomas Modes, Sagar Baitule et al.
Science and Technology of Advanced Materials
Chalcogenide Semiconductor Thin Films
article

Formation of configurable uniform CdSeTe thin films by close-space sublimation deposition of multiple alternating CdSe and CdTe layers

Robert Arndt, Pascal Jundt, Thomas Modes, Sagar Baitule, Bastian Siepchen, Olaf Zywitzki, Bettina Späth
article en

Abstract

Incorporation of selenium within cadmium telluride to form the CdSe<sub>x</sub>Te<sub>1-x</sub> alloy has enabled higher device efficiencies in photovoltaic applications through improved passivation and current collection. Recent investigations of this alloy have simultaneously indicated significant potential for further performance gains as well as potentially serious detrimental characteristics. Exploring how best to utilize this important material requires consistent, configurable film deposition. Absorber layers are often deposited by close-space sublimation, which can produce high-quality films at large scale. It has previously been demonstrated that close-space sublimation of CdSeTe material directly is inconvenient and inflexible; therefore, an alternative method with greater consistency and control over film composition is sought. In this work, CdSeTe films were formed by close-space sublimation of alternating CdSe and CdTe layers followed by a high-temperature annealing in the presence of CdCl<sub>2</sub>. Under the optimal deposition conditions, this technique was shown to produce high-quality films of CdSeTe with homogeneous elemental distribution, uniform grain size, and low roughness. However, this method also exhibited a significant tendency to form numerous voids which largely persist after CdCl<sub>2</sub> annealing. The source of this porosity was investigated and determined to primarily be resublimation of CdTe during the higher-temperature deposition of the CdSe layers. The process window to prevent voiding was observed to be rather small; while this would be a significant detriment in a production setting, it is less important in the targeted application for this approach, which is fundamental material and device investigations.

Science and Technology of Advanced MaterialsVol. 27(1)
Industrial Solar (Germany) (DE), Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology (DE)
Openalex Percentile: Top 42%
Chalcogenide Semiconductor Thin Films
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