Sputtering-driven formation of interstitial oxygen for intrinsic NIR detection in IGZO phototransistor

Amorphous indium gallium zinc oxide (a-IGZO) is a promising wide-bandgap semiconductor for large-area optoelectronics; however, its intrinsic insensitivity to sub-bandgap photons typically necessitates extrinsic dopants or heterostructures for near-infrared (NIR) photodetection. Here, we report a heterostructure-free and dopant-free broadband phototransistor that achieves intrinsic NIR sensitivity through geometry-driven defect engineering during sputter deposition. Amorphous IGZO thin films with a nominal In: Ga: Zn atomic ratio of ≈ 1:2:1 were deposited using on-axis (vertical) and off-axis (horizontal) sputtering configurations. While on-axis IGZO only exhibited visible-light photosensitivity, off-axis IGZO displayed a pronounced NIR response, enabled by the formation of interstitial oxygen (Oi) shallow states. X-ray photoelectron spectroscopy (XPS) and composition-matched density functional theory (DFT) calculations confirmed that these Oi-induced defect states lie 0.1–0.5 eV above the valence band maximum (VBM), effectively narrowing the optical bandgap and enabling sub-gap absorption and photogating under 850 nm illumination. The optimized a-IGZO phototransistor achieves a responsivity of 42.5 A W-1, an external quantum efficiency of 6.2 × 103%, and a specific detectivity of 8.3 × 1011 Jones, all without plasmonic, hybrid, or quantum-dot sensitizers. Moreover, the off-axis process exhibits < 10% device-to-device variation across 5 samples, confirming its robustness and compatibility with large-area fabrication. To validate its practical utility, the off-axis IGZO device was further employed to quantify the sugar content (Brix) of coffee samples under NIR illumination, showing a clear correlation between photocurrent and concentration. This work demonstrates a simple, scalable, and CMOS-compatible approach to extending the spectral response of oxide semiconductors, opening new opportunities for cost-effective broadband photodetectors and integrated photonic systems.

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Journal
Scientific Reports
Published
2026-02-25
DOI
https://doi.org/10.1038/s41598-026-40769-z
Primary Topic
Luminescence Properties of Advanced Materials
Type
article
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article

Sputtering-driven formation of interstitial oxygen for intrinsic NIR detection in IGZO phototransistor

H Y Lee, Jinsik Choe, Sungjin Park, Mann-Ho Cho et al.
Scientific Reports
Luminescence Properties of Advanced Materials
article

Sputtering-driven formation of interstitial oxygen for intrinsic NIR detection in IGZO phototransistor

H Y Lee, Jinsik Choe, Sungjin Park, Mann-Ho Cho, Hyeonmin Bong, Sahn Nahm, Dong-Hun Yeo, In Soo Kim
article en

Abstract

Amorphous indium gallium zinc oxide (a-IGZO) is a promising wide-bandgap semiconductor for large-area optoelectronics; however, its intrinsic insensitivity to sub-bandgap photons typically necessitates extrinsic dopants or heterostructures for near-infrared (NIR) photodetection. Here, we report a heterostructure-free and dopant-free broadband phototransistor that achieves intrinsic NIR sensitivity through geometry-driven defect engineering during sputter deposition. Amorphous IGZO thin films with a nominal In: Ga: Zn atomic ratio of ≈ 1:2:1 were deposited using on-axis (vertical) and off-axis (horizontal) sputtering configurations. While on-axis IGZO only exhibited visible-light photosensitivity, off-axis IGZO displayed a pronounced NIR response, enabled by the formation of interstitial oxygen (Oi) shallow states. X-ray photoelectron spectroscopy (XPS) and composition-matched density functional theory (DFT) calculations confirmed that these Oi-induced defect states lie 0.1–0.5 eV above the valence band maximum (VBM), effectively narrowing the optical bandgap and enabling sub-gap absorption and photogating under 850 nm illumination. The optimized a-IGZO phototransistor achieves a responsivity of 42.5 A W-1, an external quantum efficiency of 6.2 × 103%, and a specific detectivity of 8.3 × 1011 Jones, all without plasmonic, hybrid, or quantum-dot sensitizers. Moreover, the off-axis process exhibits < 10% device-to-device variation across 5 samples, confirming its robustness and compatibility with large-area fabrication. To validate its practical utility, the off-axis IGZO device was further employed to quantify the sugar content (Brix) of coffee samples under NIR illumination, showing a clear correlation between photocurrent and concentration. This work demonstrates a simple, scalable, and CMOS-compatible approach to extending the spectral response of oxide semiconductors, opening new opportunities for cost-effective broadband photodetectors and integrated photonic systems.

Scientific Reports
Argonne National Laboratory (US), Yonsei University (KR), Korea University (KR), University Health System (US), Korea Institute of Ceramic Engineering and Technology (KR), Yonsei University Health System (KR)
Openalex Percentile: Top 45%
Luminescence Properties of Advanced Materials
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