Intraband circular photogalvanic effect in Weyl semimetals

We apply the semiclassical theory including the Berry curvature dipole, side jumps and skew scattering for a quantitative description of the circular photogalvanic effect (CPGE) in Weyl semimetals at intraband absorption. In contrast to gapped systems where they completely exhaust all contributions to the CPGE current, all previously known semiclassical mechanisms give a result different from that obtained using a complete quantum-mechanical approach. We show that this difference in the existing quasiclassical and full quantum-mechanical approaches persists at all spatial ranges of the disorder potential. Apparently, the implementation of another microscopic mechanism into the quasiclassical description of the CPGE is required.

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Publication Details

Journal
Annals of Physics
Published
2026-02-25
DOI
https://doi.org/10.1016/j.aop.2026.170415
Primary Topic
Topological Materials and Phenomena
Type
article
Field-Weighted Citation Impact
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article

Intraband circular photogalvanic effect in Weyl semimetals

E.L. Ivchenko, L.E. Golub
Annals of Physics
Topological Materials and Phenomena
article

Intraband circular photogalvanic effect in Weyl semimetals

E.L. Ivchenko, L.E. Golub
article en

Abstract

We apply the semiclassical theory including the Berry curvature dipole, side jumps and skew scattering for a quantitative description of the circular photogalvanic effect (CPGE) in Weyl semimetals at intraband absorption. In contrast to gapped systems where they completely exhaust all contributions to the CPGE current, all previously known semiclassical mechanisms give a result different from that obtained using a complete quantum-mechanical approach. We show that this difference in the existing quasiclassical and full quantum-mechanical approaches persists at all spatial ranges of the disorder potential. Apparently, the implementation of another microscopic mechanism into the quasiclassical description of the CPGE is required.

Annals of PhysicsVol. 488
University of Regensburg (DE), Ioffe Institute (RU)
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Openalex Percentile: Top 44%
Topological Materials and Phenomena
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