Author Correction: Mechanically reliable and electronically uniform monolayer MoS2 by passivation and defect healing

In the version of the article initially published, the "SiO 2 " label in Fig. 2c should have read "Au/Ti/ SiO/Si".In the caption of Fig. 4, the text "Scale bars, Fourier transforms in (a, b), 2 nm -1 " should have read "Scale bars, Fourier transforms in (a, b), 2.5 nm -1 ."In the "Monolayer MoS 2 sample preparation" section of the Methods, the text "Holes of 2 m in diameter and 500 nm in depth" should have read "Holes of 2 m in diameter and ~1.5 m in depth."In the "AFM" section of the Methods, the text "signaled by large (>100 nm)" should have read "signaled by large (>1 m)".In the "Weibull statistical analysis" section of the Methods, the text "Plot the data in the form of ln[ln(1-P)] versus ln(t)" should have read "Plot the data in the form of ln[-ln(1-P)] versus ln() or (vs lnt)".These corrections have now been made to the HTML and PDF versions of the article.