Hole transport analysis in N-polar p-GaN

The transport-limiting scattering mechanisms in N-polar p-GaN were identified over a wide range of temperatures (220–770 K), Mg doping concentrations (3 × 1018–4 × 1019 cm−3), and V/III ratios (100–8000). Temperature-dependent Hall measurements, combined with a charge balance model, were employed to extract the acceptor (NA) and donor (ND) concentrations. These values enabled the determination of the temperature-dependent Hall factor (rH), allowing the conversion of the measured Hall mobility (μHall) to drift mobility (μdrift). The experimental drift mobility was then fitted using a mobility model, which incorporates six scattering mechanisms, including coulomb scattering by charged dislocation lines. The model identified charged dislocation scattering as the transport-limiting scattering mechanism at both room and low temperatures. The origin of coulomb scattering—donor-like traps along threading edge dislocations—was attributed to charged nitrogen vacancy-related defects [(VN−nMgGa)3−n, where n = 0, 1, or 2], with their concentration controllable through [Mg] and the nitrogen chemical potential (i.e., V/III ratio).

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Publication Details

Journal
Journal of Applied Physics
Published
2026-02-18
DOI
https://doi.org/10.1063/5.0316562
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

Hole transport analysis in N-polar p-GaN

Seiji Mita, Ronny Kirste, Masahiro Kamiyama, Zlatko Sitar et al.
Journal of Applied Physics
GaN-based semiconductor devices and materials
article

Hole transport analysis in N-polar p-GaN

Seiji Mita, Ronny Kirste, Masahiro Kamiyama, Zlatko Sitar, Shashwat Rathkanthiwar, Ramón Collazo, Cristyan Quiñones, Pramod Reddy
article en

Abstract

The transport-limiting scattering mechanisms in N-polar p-GaN were identified over a wide range of temperatures (220–770 K), Mg doping concentrations (3 × 1018–4 × 1019 cm−3), and V/III ratios (100–8000). Temperature-dependent Hall measurements, combined with a charge balance model, were employed to extract the acceptor (NA) and donor (ND) concentrations. These values enabled the determination of the temperature-dependent Hall factor (rH), allowing the conversion of the measured Hall mobility (μHall) to drift mobility (μdrift). The experimental drift mobility was then fitted using a mobility model, which incorporates six scattering mechanisms, including coulomb scattering by charged dislocation lines. The model identified charged dislocation scattering as the transport-limiting scattering mechanism at both room and low temperatures. The origin of coulomb scattering—donor-like traps along threading edge dislocations—was attributed to charged nitrogen vacancy-related defects [(VN−nMgGa)3−n, where n = 0, 1, or 2], with their concentration controllable through [Mg] and the nitrogen chemical potential (i.e., V/III ratio).

Journal of Applied PhysicsVol. 139(7)
North Carolina State University (US), Adroit Materials (United States) (US)
Openalex Percentile: Top 50%
GaN-based semiconductor devices and materials
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Hole transport analysis in N-polar p-GaN — Seiji Mita, Ronny Kirste, et al. · Journal of Applied Physics (2026) | TGRS Research Map | TGRS