Hole transport analysis in N-polar p-GaN
The transport-limiting scattering mechanisms in N-polar p-GaN were identified over a wide range of temperatures (220–770 K), Mg doping concentrations (3 × 1018–4 × 1019 cm−3), and V/III ratios (100–8000). Temperature-dependent Hall measurements, combined with a charge balance model, were employed to extract the acceptor (NA) and donor (ND) concentrations. These values enabled the determination of the temperature-dependent Hall factor (rH), allowing the conversion of the measured Hall mobility (μHall) to drift mobility (μdrift). The experimental drift mobility was then fitted using a mobility model, which incorporates six scattering mechanisms, including coulomb scattering by charged dislocation lines. The model identified charged dislocation scattering as the transport-limiting scattering mechanism at both room and low temperatures. The origin of coulomb scattering—donor-like traps along threading edge dislocations—was attributed to charged nitrogen vacancy-related defects [(VN−nMgGa)3−n, where n = 0, 1, or 2], with their concentration controllable through [Mg] and the nitrogen chemical potential (i.e., V/III ratio).
Authors
- Seiji Mita (ORCID: https://orcid.org/0009-0002-8312-107X)
- Ronny Kirste (ORCID: https://orcid.org/0000-0002-2596-4450)
- Masahiro Kamiyama (ORCID: https://orcid.org/0009-0001-9601-6394)
- Zlatko Sitar (ORCID: https://orcid.org/0000-0002-7385-0837)
- Shashwat Rathkanthiwar (ORCID: https://orcid.org/0000-0003-0180-1398)
- Ramón Collazo (ORCID: https://orcid.org/0000-0002-5229-3824)
- Cristyan Quiñones
- Pramod Reddy
Institutions
- North Carolina State University (US)
- Adroit Materials (United States) (US)
Publication Details
- Journal
- Journal of Applied Physics
- Published
- 2026-02-18
- DOI
- https://doi.org/10.1063/5.0316562
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00