In Situ Transmission Electron Microscopy Visualization of Electric-Field-Induced Phase Transitions at the Morphotropic Phase Boundary in Hf <sub>0.5</sub> Zr <sub>0.5</sub> O <sub>2</sub>

Understanding electric-field-induced phase transitions is crucial for optimizing the ferroelectric and antiferroelectric properties of hafnium zirconium oxide (Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub>, HZO) thin films. Here, we use in situ transmission electron microscopy (TEM) to uncover the nanoscale mechanism of field-induced phase evolution in ultrathin HZO films at the morphotropic phase boundary (MPB), directly visualizing oxygen vacancy migration and its correlation with the transformation from the nonpolar tetragonal to polar orthorhombic phase. Our in situ TEM setup applied sub-100 μs bipolar voltage pulses, mimicking real device operation while allowing the detection of the subtle changes induced by such short pulses. Unsupervised machine learning analysis of electron energy-loss spectroscopy spectrum images (EELS-SIs) revealed distinct spectral features associated with local structural evolution, with quantitative results confirming oxygen-deficient regions aligned with orthorhombic phase formation. Unlike conventional TEM studies confined to a few nanoscale domains, this approach enables film-scale interpretation of phase evolution, capturing broader trends beyond isolated observations. Concurrent oxygen content changes in the TiN electrode further indicate active vacancy exchange between HZO and TiN under bias. These findings directly link oxygen vacancy dynamics to polarization switching, offering critical guidance for stabilizing ferroelectric phases and advancing next-generation memory and logic devices.

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Journal
ACS Nano
Published
2026-02-18
DOI
https://doi.org/10.1021/acsnano.5c15856
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
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article

In Situ Transmission Electron Microscopy Visualization of Electric-Field-Induced Phase Transitions at the Morphotropic Phase Boundary in Hf 0.5 Zr 0.5 O 2

Jinseok Ryu, Jung Ho Yoon, SangHyo Lee, M. Joon Kim et al.
ACS Nano
Ferroelectric and Negative Capacitance Devices
article

In Situ Transmission Electron Microscopy Visualization of Electric-Field-Induced Phase Transitions at the Morphotropic Phase Boundary in Hf 0.5 Zr 0.5 O 2

Jinseok Ryu, Jung Ho Yoon, SangHyo Lee, M. Joon Kim, Sojin Kim, Ji Eun Kim, Ju-Young Cha, Yunho Shin, M. H. Park, Daewoong Kwon, Jaewook Lee, Seung-Yong Lee
article en

Abstract

Understanding electric-field-induced phase transitions is crucial for optimizing the ferroelectric and antiferroelectric properties of hafnium zirconium oxide (Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub>, HZO) thin films. Here, we use in situ transmission electron microscopy (TEM) to uncover the nanoscale mechanism of field-induced phase evolution in ultrathin HZO films at the morphotropic phase boundary (MPB), directly visualizing oxygen vacancy migration and its correlation with the transformation from the nonpolar tetragonal to polar orthorhombic phase. Our in situ TEM setup applied sub-100 μs bipolar voltage pulses, mimicking real device operation while allowing the detection of the subtle changes induced by such short pulses. Unsupervised machine learning analysis of electron energy-loss spectroscopy spectrum images (EELS-SIs) revealed distinct spectral features associated with local structural evolution, with quantitative results confirming oxygen-deficient regions aligned with orthorhombic phase formation. Unlike conventional TEM studies confined to a few nanoscale domains, this approach enables film-scale interpretation of phase evolution, capturing broader trends beyond isolated observations. Concurrent oxygen content changes in the TiN electrode further indicate active vacancy exchange between HZO and TiN under bias. These findings directly link oxygen vacancy dynamics to polarization switching, offering critical guidance for stabilizing ferroelectric phases and advancing next-generation memory and logic devices.

ACS NanoVol. 20(8)
Seoul National University (KR), Diamond Light Source (GB), Division of Materials Science and Engineering (AU), Materials Research Center (IN), Artificial Intelligence in Medicine (Canada) (CA), Imaging Center (US), Hanyang University (KR), Korea Institute of Science and Technology (KR), Sungkyunkwan University (KR)
Openalex Percentile: Top 52%
Ferroelectric and Negative Capacitance Devices
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