Efficient and Robust p-Type Transistor Based on Ultrawide-Bandgap Semiconductor

The <i>p</i>-type transistor is an indispensable component of semiconductor technology, enabling a complementary operation with <i>n</i>-channel transistors for computation, storage, and communication. Achieving both high robustness and high efficiency is highly desirable but challenging for <i>p</i>-type transistors due to the limited semiconductors with reliable hole transport and their high activation energies. Here, we achieved a robust yet efficient <i>p</i>-type transistor by heterogeneously integrating an ultrawide-bandgap semiconductor and a high-<i>κ</i> dielectric layer through van der Waals integration. The <i>p</i>-type transistor employs a two-dimensional hole channel on hydrogenated diamond (bandgap 5.6 eV) combined with a high-<i>κ</i> (30.5) SrTiO<sub>3</sub> perovskite membrane. At room temperature, the transistor exhibits stable operation with a high on-current (∼200 mA/mm), low subthreshold swing (70 mV/dec), high hole mobility (566 cm<sup>2</sup>/(V·s) to 572 cm<sup>2</sup>/(V·s)), and high on-off ratio (∼10<sup>9</sup>). Furthermore, tuning the annealing temperature allows operation in either enhancement or depletion mode. The robust <i>p</i>-type transistor with high efficiency holds great potential for future power electronics, ultraviolet (UV) optoelectronics, and harsh-environment electronic applications.

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Publication Details

Journal
ACS Nano
Published
2026-02-17
DOI
https://doi.org/10.1021/acsnano.5c22605
Primary Topic
Electronic and Structural Properties of Oxides
Type
article
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article

Efficient and Robust p-Type Transistor Based on Ultrawide-Bandgap Semiconductor

Dongchen Qi, S. C. Wang, Alastair Stacey, Yuefeng Yin et al.
ACS Nano
Electronic and Structural Properties of Oxides
article

Efficient and Robust p-Type Transistor Based on Ultrawide-Bandgap Semiconductor

Dongchen Qi, S. C. Wang, Alastair Stacey, Yuefeng Yin, David A. Broadway, James A. Belcourt, Shifan Wang, Huiping Han, Liang Wu, Xing Kx, Zherui Yang, Xinmao Yin, Qingdong Ou, Xiao Renshaw Wang, Hang Yin, Weiyao Zhao, Jean-Philippe Tetienne, Sergey Rubanov, Michael S. Fuhrer
article en

Abstract

The <i>p</i>-type transistor is an indispensable component of semiconductor technology, enabling a complementary operation with <i>n</i>-channel transistors for computation, storage, and communication. Achieving both high robustness and high efficiency is highly desirable but challenging for <i>p</i>-type transistors due to the limited semiconductors with reliable hole transport and their high activation energies. Here, we achieved a robust yet efficient <i>p</i>-type transistor by heterogeneously integrating an ultrawide-bandgap semiconductor and a high-<i>κ</i> dielectric layer through van der Waals integration. The <i>p</i>-type transistor employs a two-dimensional hole channel on hydrogenated diamond (bandgap 5.6 eV) combined with a high-<i>κ</i> (30.5) SrTiO<sub>3</sub> perovskite membrane. At room temperature, the transistor exhibits stable operation with a high on-current (∼200 mA/mm), low subthreshold swing (70 mV/dec), high hole mobility (566 cm<sup>2</sup>/(V·s) to 572 cm<sup>2</sup>/(V·s)), and high on-off ratio (∼10<sup>9</sup>). Furthermore, tuning the annealing temperature allows operation in either enhancement or depletion mode. The robust <i>p</i>-type transistor with high efficiency holds great potential for future power electronics, ultraviolet (UV) optoelectronics, and harsh-environment electronic applications.

ACS NanoVol. 20(8)
Kunming University of Science and Technology (CN), Macau University of Science and Technology (MO), Shanghai University (CN), Australian National University (AU), Queensland University of Technology (AU), The University of Melbourne (AU), Nanyang Technological University (SG), Princeton Plasma Physics Laboratory (US), Australian Regenerative Medicine Institute (AU), Faculty (United Kingdom) (GB), MIT University (MK), And Technology Research (United Kingdom) (GB), Centre for Biomedical Engineering and Physics (SE), Division of Materials Science and Engineering (AU), Institute of High Temperature Electrochemistry (RU), Macao Polytechnic University (MO), Monash University (AU), RMIT University (AU)
Affordable and clean energy
Openalex Percentile: Top 54%
Electronic and Structural Properties of Oxides
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