Enhancing Grayscale E‐Beam Lithography: Thermal Treatment of Novolak‐Based Resist for 3D Nanostructures (Adv. Mater. Interfaces 4/2026)
Grayscale 3D-Nanostrucures In the Research Article (DOI: 10.1002/admi.202500632) Winnie Edith Svendsen and co-workers demonstrate the fabrication of high-resolution 3D nanostructures using grayscale electron beam lithography. By tuning exposure dose and post-exposure thermal treatment of novolak-based resist, they reveal dose and temperature dependent reflow and chemical evolution, enabling fabrication of complex topographies for applications in photonics, biomimetics, and surface engineering. Art by Rahul Singh.
Authors
- Christian Vinther Bertelsen (ORCID: https://orcid.org/0000-0001-6159-0559)
- Neeti Kalyani (ORCID: https://orcid.org/0000-0001-8102-3930)
- Maria Dimaki (ORCID: https://orcid.org/0000-0001-5037-2388)
- Rahul K. Singh (ORCID: https://orcid.org/0009-0008-2108-7869)
- Winnie Edith Svendsen
Institutions
- Technical University of Denmark (DK)
Publication Details
- Journal
- Advanced Materials Interfaces
- Published
- 2026-02-01
- DOI
- https://doi.org/10.1002/admi.70374
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00