van der Waals dielectrics for threshold engineering in two-dimensional field effect transistors

Two-dimensional (2D) semiconductors are promising for next-generation field-effect transistors (FETs), but their integration into complementary-metal-oxide-semiconductors (CMOS) logic is hindered by improper threshold voltages ( <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> ), leading to excessive power consumption. While past efforts have focused on improving gate electrostatics and near-ideal subthreshold swing ( <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mi>S</mml:mi> <mml:mi>S</mml:mi></mml:math> ), systematic <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> engineering in 2D FETs remains unexplored. Here, we investigate high-κ van der Waals (vdW) dielectrics including metal oxyhalides such as LaOBr, BiOBr, and BiOCl, and bimetallic thiophosphates such as LiInP<sub>2</sub>S<sub>6</sub> (LIPS), LiInP<sub>2</sub>Se<sub>6</sub> (LIPSe) and CuInP<sub>2</sub>S<sub>6</sub> (CIPS), and demonstrate that bimetallic thiophosphates enable programmable and non-volatile <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> tuning in both n-type monolayer MoS<sub>2</sub> and p-type bilayer WSe<sub>2</sub> FETs. Leveraging ion-mediated <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> tuning, we realize 2D CMOS inverters with nearly three orders of magnitude reduction in static power while maintaining high switching speed. Combining experiments with industry-compatible SPICE modeling, we identify an optimal <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> window that minimizes power with negligible delay overhead, enabling built-in power gating and improved power-performance-area metrics without additional sleep transistors.

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Publication Details

Journal
Nature Communications
Published
2026-02-16
DOI
https://doi.org/10.1038/s41467-026-69089-6
Primary Topic
2D Materials and Applications
Type
article
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article

van der Waals dielectrics for threshold engineering in two-dimensional field effect transistors

Joan Marie Redwing, Safdar Imam, Dipanjan Sen, Shubham Sahay et al.
Nature Communications
2D Materials and Applications
article

van der Waals dielectrics for threshold engineering in two-dimensional field effect transistors

Joan Marie Redwing, Safdar Imam, Dipanjan Sen, Shubham Sahay, Vlastimil Mazánek, Harikrishnan Ravichandran, Zdenek Sofer, Chen Chen, Jan Luxa, Saptarshi Das, Md Yasir Bashir, Subir Ghosh, Krishnendu Mukhopadhyay, Thomas S. Ie, Mercouri G. Kanatzidis
article en

Abstract

Two-dimensional (2D) semiconductors are promising for next-generation field-effect transistors (FETs), but their integration into complementary-metal-oxide-semiconductors (CMOS) logic is hindered by improper threshold voltages ( <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> ), leading to excessive power consumption. While past efforts have focused on improving gate electrostatics and near-ideal subthreshold swing ( <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mi>S</mml:mi> <mml:mi>S</mml:mi></mml:math> ), systematic <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> engineering in 2D FETs remains unexplored. Here, we investigate high-κ van der Waals (vdW) dielectrics including metal oxyhalides such as LaOBr, BiOBr, and BiOCl, and bimetallic thiophosphates such as LiInP<sub>2</sub>S<sub>6</sub> (LIPS), LiInP<sub>2</sub>Se<sub>6</sub> (LIPSe) and CuInP<sub>2</sub>S<sub>6</sub> (CIPS), and demonstrate that bimetallic thiophosphates enable programmable and non-volatile <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> tuning in both n-type monolayer MoS<sub>2</sub> and p-type bilayer WSe<sub>2</sub> FETs. Leveraging ion-mediated <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> tuning, we realize 2D CMOS inverters with nearly three orders of magnitude reduction in static power while maintaining high switching speed. Combining experiments with industry-compatible SPICE modeling, we identify an optimal <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub><mml:mrow><mml:mi>V</mml:mi></mml:mrow> <mml:mrow><mml:mi>t</mml:mi> <mml:mi>h</mml:mi></mml:mrow> </mml:msub> </mml:math> window that minimizes power with negligible delay overhead, enabling built-in power gating and improved power-performance-area metrics without additional sleep transistors.

Nature CommunicationsVol. 17(1)
Northwestern University (US), Pennsylvania State University (US), University of Chemistry and Technology, Prague (CZ), Indian Institute of Technology Kanpur (IN)
National Science Foundation, Northwestern University, Department of Science and Technology, Ministry of Science and Technology, India, Ministerstvo Školství, Mládeže a Tělovýchovy, Grantová Agentura České Republiky, Ministry of Education, India, Office of Naval Research, Division of Materials Research, Division of Electrical, Communications and Cyber Systems, Army Research Office
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2D Materials and Applications
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