Depth of field in phase-contrast transmission electron microscopy

The depth of field (DoF) is an important parameter in transmission electron microscopy (TEM) when considering inhomogeneous samples, tomographic schemes, or in-situ experiments. A large DoF enhances the robustness of the experiment against tight alignment demands and drift issues. The phase-contrast transfer in TEM is reviewed and updated with special regard to the correct derivation and quantification of the DoF for relevant single-transfer-band imaging like with Scherzer or Lentzen conditions. Consequences towards the optimisation of the imaging conditions are discussed. Additionally, the defocus-dependent information limit is treated as a different type of DoF. One result of this work is to prefer the original Scherzer defocus over the Scherzer defocus taught today if a large DoF matters in non-aberration-corrected instruments. In aberration-corrected instruments, the Lentzen conditions are well suited for a maximum DoF if one adapts the desired maximum spatial frequency accordingly, and higher-order spherical-aberration correction might help at lower electron acceleration voltages.

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Publication Details

Journal
Micron
Published
2026-02-14
DOI
https://doi.org/10.1016/j.micron.2026.104003
Primary Topic
Advanced Electron Microscopy Techniques and Applications
Type
article
Field-Weighted Citation Impact
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article

Depth of field in phase-contrast transmission electron microscopy

Felix Börrnert
Micron
Advanced Electron Microscopy Techniques and Applications
article

Depth of field in phase-contrast transmission electron microscopy

Felix Börrnert
article en

Abstract

The depth of field (DoF) is an important parameter in transmission electron microscopy (TEM) when considering inhomogeneous samples, tomographic schemes, or in-situ experiments. A large DoF enhances the robustness of the experiment against tight alignment demands and drift issues. The phase-contrast transfer in TEM is reviewed and updated with special regard to the correct derivation and quantification of the DoF for relevant single-transfer-band imaging like with Scherzer or Lentzen conditions. Consequences towards the optimisation of the imaging conditions are discussed. Additionally, the defocus-dependent information limit is treated as a different type of DoF. One result of this work is to prefer the original Scherzer defocus over the Scherzer defocus taught today if a large DoF matters in non-aberration-corrected instruments. In aberration-corrected instruments, the Lentzen conditions are well suited for a maximum DoF if one adapts the desired maximum spatial frequency accordingly, and higher-order spherical-aberration correction might help at lower electron acceleration voltages.

MicronVol. 203
Leibniz Institute for Solid State and Materials Research (DE)
Openalex Percentile: Top 65%
Advanced Electron Microscopy Techniques and Applications
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