Monolithic Integration of InAs Quantum Dot Lasers with Waveguide Photodetector on CMOS-Compatible (001) Silicon

Silicon photonics requires CMOS-compatible, on-chip, efficient laser diodes (LDs) and low-noise photodetectors (PDs). Here, we demonstrate the monolithic integration of InAs QD LDs and waveguide PDs (WPDs) on CMOS-compatible (001) silicon by employing an identical epitaxial structure. The device exhibits bias-selective operation with both components isolated by XeF<sub>2</sub>-assisted focused ion beam trenching, a strategy ideal for LDs and PDs that require precise positioning yet occupy a minimal package footprint. The LD exhibits a low threshold current density of 170 A/cm<sup>2</sup> and a single-facet continuous-wave output power of 48 mW, while the WPD shows a low dark current density of 4.9 × 10<sup>-5</sup> A/cm<sup>2</sup> at -1 V and a broad O-band spectral response. The integrated LD-WPD system shows a clear correlation between LD output power and WPD photocurrent with an estimated responsivity of 0.118 A/W. Our results demonstrate the feasibility of on-chip power monitoring, paving the way for compact, reliable, and high-density photonic integration.

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Publication Details

Journal
Nano Letters
Published
2026-02-13
DOI
https://doi.org/10.1021/acs.nanolett.5c05613
Primary Topic
Advanced Optical Sensing Technologies
Type
article
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article

Monolithic Integration of InAs Quantum Dot Lasers with Waveguide Photodetector on CMOS-Compatible (001) Silicon

ZhanGuo WANG, Lizhi Wang, Chunlai Xue, Beibei Xu et al.
Nano Letters
Advanced Optical Sensing Technologies
article

Monolithic Integration of InAs Quantum Dot Lasers with Waveguide Photodetector on CMOS-Compatible (001) Silicon

ZhanGuo WANG, Lizhi Wang, Chunlai Xue, Beibei Xu, S. Chen, Wenkang Zhan, Shujie Pan, Chao Zhao, Dong Han, Chao Shen, Hui Cong
article en

Abstract

Silicon photonics requires CMOS-compatible, on-chip, efficient laser diodes (LDs) and low-noise photodetectors (PDs). Here, we demonstrate the monolithic integration of InAs QD LDs and waveguide PDs (WPDs) on CMOS-compatible (001) silicon by employing an identical epitaxial structure. The device exhibits bias-selective operation with both components isolated by XeF<sub>2</sub>-assisted focused ion beam trenching, a strategy ideal for LDs and PDs that require precise positioning yet occupy a minimal package footprint. The LD exhibits a low threshold current density of 170 A/cm<sup>2</sup> and a single-facet continuous-wave output power of 48 mW, while the WPD shows a low dark current density of 4.9 × 10<sup>-5</sup> A/cm<sup>2</sup> at -1 V and a broad O-band spectral response. The integrated LD-WPD system shows a clear correlation between LD output power and WPD photocurrent with an estimated responsivity of 0.118 A/W. Our results demonstrate the feasibility of on-chip power monitoring, paving the way for compact, reliable, and high-density photonic integration.

Nano LettersVol. 26(7)
Information Technology Institute (EG), Chinese Academy of Sciences (CN), Applied Photonics (United Kingdom) (GB), Institute of Semiconductors (CN), University of Chinese Academy of Sciences (CN)
Affordable and clean energy
Openalex Percentile: Top 57%
Advanced Optical Sensing Technologies
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