Wafer-scale PBF-LB/M additive manufacturing of SnAg3 as thermal interface materials for advanced high-power electronics cooling

To support the miniaturization of electronics with increasing power, advanced cooling strategies are needed. Unlike conventional cooling pathways for wafer-scale electronics that involve the use of thermal pastes, we introduce an additive manufacturing route using laser powder bed fusion (PBF-LB/M) to fabricate 50–200 μm thick SnAg3 deposits that function as thermal interfaces between the Si substrate and the heat exchanger. The results reveal that by fine tuning the PBF-LB/M process parameters, it is possible to engineer the microstructure of the printed thermal interface materials onto Si wafer and to limit the Si damage. These findings demonstrate a promising solution for wafer-scale additive manufacturing of advanced cooling architectures, enabling the fabrication of high-power electronics.

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Publication Details

Journal
Progress in Additive Manufacturing
Published
2026-02-12
DOI
https://doi.org/10.1007/s40964-026-01528-8
Primary Topic
Thermal properties of materials
Type
article
Field-Weighted Citation Impact
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article

Wafer-scale PBF-LB/M additive manufacturing of SnAg3 as thermal interface materials for advanced high-power electronics cooling

Riccardo Casati, Amin Hodaei, Martina Meisnar, Davoud Jafari et al.
Progress in Additive Manufacturing
Thermal properties of materials
article

Wafer-scale PBF-LB/M additive manufacturing of SnAg3 as thermal interface materials for advanced high-power electronics cooling

Riccardo Casati, Amin Hodaei, Martina Meisnar, Davoud Jafari, Andrea Mistrini
article en

Abstract

To support the miniaturization of electronics with increasing power, advanced cooling strategies are needed. Unlike conventional cooling pathways for wafer-scale electronics that involve the use of thermal pastes, we introduce an additive manufacturing route using laser powder bed fusion (PBF-LB/M) to fabricate 50–200 μm thick SnAg3 deposits that function as thermal interfaces between the Si substrate and the heat exchanger. The results reveal that by fine tuning the PBF-LB/M process parameters, it is possible to engineer the microstructure of the printed thermal interface materials onto Si wafer and to limit the Si damage. These findings demonstrate a promising solution for wafer-scale additive manufacturing of advanced cooling architectures, enabling the fabrication of high-power electronics.

Progress in Additive Manufacturing
European Space Research and Technology Centre (NL), Politecnico di Milano (IT), University of Twente (NL)
Affordable and clean energy
Openalex Percentile: Top 59%
Thermal properties of materials
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