Interlayer Stacking-Controlled Magnetism in Van der Waals Antiferromagnets
Interlayer stacking in van der Waals (vdW) magnets offers a powerful route to tailor magnetic interactions and emergent functionalities. Here, we show that transitions from aperiodic AA/AB stacking to long-range periodic 6R order govern the coexistence and competition of ferromagnetic and antiferromagnetic ground states in room-temperature vdW antiferromagnets. Stacking-controlled interlayer coupling and symmetry breaking redefine the intrinsic origins of ferromagnetism. Atomically thin flakes with distinct stacking sequences exhibit unconventional magnetic behavior that is different from the established odd-even-layer effect in vdW antiferromagnets. Moreover, stacking-dependent magnetic competition reverses the sign of magnetoresistance (negative to positive). Importantly, all thin flakes maintain magnetic order above room temperature, with a <i>T</i><sub>C</sub> of ∼340 K observed in the monolayer flake. These findings establish stacking sequences as a deterministic handle for engineering magnetic and transport properties, enabling the design of high-temperature stacking-programmable spintronic devices.
Authors
- Rong Hu
- Dongsheng Song (ORCID: https://orcid.org/0009-0005-2449-2059)
- Yupeng Ma (ORCID: https://orcid.org/0009-0004-8228-180X)
- Tianlun Yu (ORCID: https://orcid.org/0000-0001-8973-2782)
- Shaohua Yang (ORCID: https://orcid.org/0000-0002-0938-0068)
- Yu Tao (ORCID: https://orcid.org/0000-0002-0437-1568)
- Jianlin Wang (ORCID: https://orcid.org/0000-0002-5905-4981)
- Han Zhong
- Pai Li (ORCID: https://orcid.org/0009-0005-2643-4485)
- Bin Lei
- Yimin Xiong
- Yalin Lu
- Hengli Duan
- Yona Soh
- Guopeng Wang
- Mingliang Tian
Institutions
- University of Science and Technology of China (CN)
- Anhui University (CN)
- Chinese Academy of Sciences (CN)
- Paul Scherrer Institute (CH)
- Hefei University (CN)
- Joint Laboratory for Extreme Conditions Matter Properties (CN)
- High Magnetic Field Laboratory (CN)
- Hefei National Center for Physical Sciences at Nanoscale (CN)
- Microscale (United States) (US)
- Shanghai Institute of Microsystem and Information Technology (CN)
Publication Details
- Journal
- ACS Nano
- Published
- 2026-02-12
- DOI
- https://doi.org/10.1021/acsnano.5c19681
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00