Submicron Patterning Techniques for Perovskite Optoelectronics From Materials Challenges to Scalable Device Integration (Advanced Optical Materials 6/2026)
Perovskite Patterning This cover illustrates five emerging fabrication strategies for perovskite optoelectronics, including thermal deposition, nanoimprint patterning, inkjet printing, and laser ablation. At the center is direct photolithography, where photo-crosslinkable perovskite resins enable high-resolution, maskless patterning. Together, these methods highlight a versatile toolbox for scalable and integration-ready perovskite device manufacturing. More details can be found in the Research Article by Gun Young Jung, Yusin Pak, and co-workers (DOI: 10.1002/adom.202502624).
Authors
- Yusin Pak (ORCID: https://orcid.org/0000-0002-5444-6513)
- Minz Lee
- Dante Ahn
- Youngsoo Jang
- Gun Young Jung
Institutions
- Jeonju National University of Education (KR)
- Korea University (KR)
- Gwangju Institute of Science and Technology (KR)
- Korea University (JP)
- Korea Institute of Science and Technology (KR)
- Jeonbuk National University (KR)
Publication Details
- Journal
- Advanced Optical Materials
- Published
- 2026-02-01
- DOI
- https://doi.org/10.1002/adom.70879
- Primary Topic
- Perovskite Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00