Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

A parametric study reveals more sustainable etch dynamics, chromium mask selectivity, and pathways toward zero-global-warming-potential fluorine plasmas.

Authors

Publication Details

Journal
Scilight
Published
2026-02-05
DOI
https://doi.org/10.1063/10.0042430
Primary Topic
Plasma Diagnostics and Applications
Type
article
Field-Weighted Citation Impact
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article

Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

Alane Lim
Scilight
Plasma Diagnostics and Applications
article

Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

Alane Lim
article en

Abstract

A parametric study reveals more sustainable etch dynamics, chromium mask selectivity, and pathways toward zero-global-warming-potential fluorine plasmas.

ScilightVol. 2026(6)
Responsible consumption and production
Openalex Percentile: Top 65%
Plasma Diagnostics and Applications
DOISourceOpenAlex
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Harnessing sulfur hexafluoride for clearer and more efficient plasma etching — Alane Lim · Scilight (2026) | TGRS Research Map | TGRS