High-Uniformity Flat-Top Light Spot Based on a Dielectric Metasurface

With the rapid development of laser processing and infrared imaging, the demand for flat-top beams with high uniformity has become increasingly urgent. Conventional beam-shaping techniques based on bonded aspheric lenses are inherently bulky and inflexible, which limits their compatibility with modern optical systems. In this work, we propose a dielectric metasurface for laser beam shaping operating at 1064 nm, where the target phase distribution is derived by the given initial phase and is represented by a hyperbolic phase. An inverse optimization algorithm is proposed to optimize the unit cell consisting of silicon carbide (SiC) nanopillars and the silicon dioxide (SiO₂) substrate. Numerical results show that, after transmission through the designed metasurface, the beam forms a circular flat-top spot with a radius of 2 μm at the target plane, exhibiting an intensity uniformity of 0.1021 and an energy efficiency of 76.3%. This study offers a compact and highly efficient solution for the flat-top beam shaping, demonstrating significant potential for applications in precision-laser processing, optical trapping, and bioimaging.