Large-Scale Dual-Channel WSe <sub>2</sub> Reconfigurable Field-Effect Transistors with Charge-Trapping Layer for 2T TCAM and Reconfigurable Logic
Reconfigurable field-effect transistors (RFETs), which allow postfabrication switching of device polarity, are promising candidates for compact and functionally flexible circuit design. Here, we demonstrate large-scale dual n-/p-channel RFETs based on homogeneous monolayer WSe<sub>2</sub>, integrated with a charge-trapping layer. Ambipolar transport is achieved by forming parallel n- and p-type conduction paths through selective doping. In addition, a multilayer gate dielectric stack (hBN/HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>) enables complete nonvolatile switching between n- and p-type modes via charge-trapping. Exploiting this reconfigurability, we realize ternary content-addressable memory using only two RFETs (2T) per cell, where polarity combinations encode the three logic states ('0', '1', and 'X'). Furthermore, a full set of Boolean logic gates─including AND, OR, NAND, and NOR, is demonstrated using series and parallel 2T configurations. These results establish dual n-/p-channel WSe<sub>2</sub> RFETs as scalable and functionally versatile building blocks for programmable logic and memory in future computing architectures.
Authors
- Jiwon Chang (ORCID: https://orcid.org/0000-0003-0781-2522)
- Jiwon Ma
- Changwook Lee
- Eunyeong Yang
Institutions
- ON Semiconductor (United States) (US)
- Yonsei University (KR)
- Intelligent Health (United Kingdom) (GB)
Publication Details
- Journal
- Nano Letters
- Published
- 2026-02-05
- DOI
- https://doi.org/10.1021/acs.nanolett.5c04744
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00