Ascorbic Acid-Assisted Self-Assembly of 4-Aminothiophenol to Enhance Interfacial Adhesion between Copper and Ajinomoto Build-up Film

High-speed data transmission requires the formation of fine and smooth Cu wiring, which inevitably causes a decline of interfacial bonding strength between Cu and the insulating dielectric layer. In this work, 4-aminothiophenol (4-ATP) is used as a bifunctional promoter for the interfacial adhesion between a Cu foil and a widely used Ajinomoto build-up film (ABF) without coarsening the Cu surface. It is found that the introduction of ascorbic acid (AA) accelerates the self-assembly process of 4-ATP on Cu surface, as monitored by <i>in situ</i> attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS) and examined by cyclic voltammetry (CV). Peel strength tests and morphology analyses reveal that the AA-assisted 4-ATP SAM significantly enhances the interfacial adhesion between Cu and ABF, which is of practical significance in advanced packaging.

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Publication Details

Journal
Langmuir
Published
2026-02-05
DOI
https://doi.org/10.1021/acs.langmuir.5c05774
Primary Topic
Copper Interconnects and Reliability
Type
article
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article

Ascorbic Acid-Assisted Self-Assembly of 4-Aminothiophenol to Enhance Interfacial Adhesion between Copper and Ajinomoto Build-up Film

Xindi Xu, Tianwen Jiang, MA Xian-yin, Weiyi Zhang et al.
Langmuir
Copper Interconnects and Reliability
article

Ascorbic Acid-Assisted Self-Assembly of 4-Aminothiophenol to Enhance Interfacial Adhesion between Copper and Ajinomoto Build-up Film

Xindi Xu, Tianwen Jiang, MA Xian-yin, Weiyi Zhang, Yuanrong Cheng, Yang Chao, Chi Zhang
article en

Abstract

High-speed data transmission requires the formation of fine and smooth Cu wiring, which inevitably causes a decline of interfacial bonding strength between Cu and the insulating dielectric layer. In this work, 4-aminothiophenol (4-ATP) is used as a bifunctional promoter for the interfacial adhesion between a Cu foil and a widely used Ajinomoto build-up film (ABF) without coarsening the Cu surface. It is found that the introduction of ascorbic acid (AA) accelerates the self-assembly process of 4-ATP on Cu surface, as monitored by <i>in situ</i> attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS) and examined by cyclic voltammetry (CV). Peel strength tests and morphology analyses reveal that the AA-assisted 4-ATP SAM significantly enhances the interfacial adhesion between Cu and ABF, which is of practical significance in advanced packaging.

LangmuirVol. 42(6)
Fudan University (CN), Wanfang Data (China) (CN), Collaborative Innovation Center of Chemistry for Energy Materials (CN)
Openalex Percentile: Top 66%
Copper Interconnects and Reliability
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Ascorbic Acid-Assisted Self-Assembly of 4-Aminothiophenol to Enhance Interfacial Adhesion between Copper and Ajinomoto Build-up Film — Xindi Xu, Tianwen Jiang, et al. · Langmuir (2026) | TGRS Research Map | TGRS