XHEMTs on Ultrawide Bandgap Single‐Crystal AlN Substrates (Adv. Electron. Mater. 3/2026)
Single-Crystal AlN Substrates In their Research Article (10.1002/aelm.202500393), Eungkyun Kim, Debdeep Jena, Huili Grace Xing, and co-workers demonstrate single-crystal high electron mobility transistors (XHEMTs) on bulk AlN substrates for the first time, delivering exceptional RF performance. AlN XHEMTs feature ultra-thin GaN channels fully strained between AlN layers, eliminating epitaxy-substrate thermal boundary resistance. By leveraging AlN's superior thermal conductivity, these XHEMTs promise to overcome thermal performance limitations.
Authors
- Naomi Pieczulewski (ORCID: https://orcid.org/0000-0003-3455-4282)
- Eungkyun Kim (ORCID: https://orcid.org/0000-0001-9266-1524)
- Jimy Encomendero
- Huili Grace Xing
- Debdeep Jena
- David Anthony Muller
- Yu‐Hsin Chen
Institutions
- Cornell University (US)
Publication Details
- Journal
- Advanced Electronic Materials
- Published
- 2026-02-01
- DOI
- https://doi.org/10.1002/aelm.70252
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00