Successful implant placement using a UV-treated implant in a site with recurrent oroantral fistula
An oroantral fistula (OAF) is an epithelialized communication between the maxillary sinus and the oral cavity that can lead to chronic sinus infections, bone loss, and surgical complications.Implant placement in such compromised sites is particularly challenging, especially after repeated failed OAF closures.In particular, the prognosis for implant placement is often poor after repeated failed surgical closures.This report describes a successful implant placement using an ultraviolet (UV)-photofunctionalized implant in a site with recurrent OAF and severe bone loss after unsuccessful closure surgery.Despite chronic infection and poor bone quality, UV photofunctionalization restored the bioactivity and hydrophilicity of the titanium surface, improving cellular attachment and osseointegration.The combined use of UV photofunctionalization and advanced implant macrodesign achieved stable osseointegration and long-term function even in a surgically and biologically compromised site.UV-treated implants may be a viable treatment option for implant rehabilitation in high-risk OAF cases.
Authors
- J.H. Ku
- Pil Young Yun
- Sooshin Hwang
- Min-Joong Kim
Institutions
- Seoul National University (KR)
- Seoul National University Bundang Hospital (KR)
- Armed Forces Capital Hospital (KR)
Publication Details
- Journal
- Journal of Dental Implant Research
- Published
- 2026-02-04
- DOI
- https://doi.org/10.54527/jdir.2026.45.1.1
- Primary Topic
- Cleft Lip and Palate Research
- Type
- article
- Field-Weighted Citation Impact
- 0.00