Soft X-ray emission of nickel silicides and nickel aluminides

Measurements are presented of the Si and Al L X-ray emission bands of Ni silicides (Ni31Si12 and Ni2Si) and Ni aluminides (Ni2Al3 and NiAl3). The spectra, obtained with a soft X-ray spectrometer and electron beam excitation, reflect the distribution of Si and Al s- and d-states in the valence band. The experimental spectra are compared with X-ray emission spectra calculated from the local and partial densities of states obtained with density functional theory.

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Publication Details

Journal
Springer Link (Chiba Institute of Technology)
Published
2026-01-29
DOI
https://doi.org/10.1051/epjconf/202634901010/pdf
Primary Topic
Semiconductor materials and interfaces
Type
article
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article

Soft X-ray emission of nickel silicides and nickel aluminides

Philippe Jonnard, Jordi Ibàñez-Insa, Xavier Llovet, Aurélien Moy
Springer Link (Chiba Institute of Technology)
Semiconductor materials and interfaces
article

Soft X-ray emission of nickel silicides and nickel aluminides

Philippe Jonnard, Jordi Ibàñez-Insa, Xavier Llovet, Aurélien Moy
article en

Abstract

Measurements are presented of the Si and Al L X-ray emission bands of Ni silicides (Ni31Si12 and Ni2Si) and Ni aluminides (Ni2Al3 and NiAl3). The spectra, obtained with a soft X-ray spectrometer and electron beam excitation, reflect the distribution of Si and Al s- and d-states in the valence band. The experimental spectra are compared with X-ray emission spectra calculated from the local and partial densities of states obtained with density functional theory.

Springer Link (Chiba Institute of Technology)
Openalex Percentile: Top 67%
Semiconductor materials and interfaces
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