Universal and Nondestructive Direct Photolithography of Colloidal Quantum Dots Using Photocrosslinkable Polymer Blends (Adv. Funct. Mater. 10/2026)
Direct Photolithography In their Research Article (10.1002/adfm.202520047), Jaehoon Lim, Do-Hoon Hwang, Jeongkyun Roh, and co-workers present a universal and nondestructive direct photolithography method that enables high-resolution quantum dot (QD) patterning without ligand exchange. By blending QDs with a photocrosslinkable polymer, this approach preserves optical properties while enhancing QD-LED efficiency and operational lifetime, paving the way for next-generation display technologies.
Authors
- Jaeyeop Lee
- Hyoung-Jun Kim (ORCID: https://orcid.org/0000-0003-0101-3172)
- Yeyun Bae
- Jaehoon Lim (ORCID: https://orcid.org/0000-0003-2623-3550)
- W. Jung
- ChaeGwang Lim
- Kyoungeun Lee (ORCID: https://orcid.org/0000-0002-4671-2033)
- Seon Lee Kwak (ORCID: https://orcid.org/0000-0002-5264-7274)
- Jiyoon Oh
- Byeong Guk Jeong (ORCID: https://orcid.org/0000-0002-0544-364X)
- Jeongkyun Roh (ORCID: https://orcid.org/0000-0002-0674-572X)
- Jisu Han (ORCID: https://orcid.org/0000-0001-7061-3425)
- Do‐Hoon Hwang
- Jaehoon Lim
- Keon Woo Kim
- Hyeonjun Lee
Institutions
- Pusan National University (KR)
- Sungkyunkwan University (KR)
Publication Details
- Journal
- Advanced Functional Materials
- Published
- 2026-02-01
- DOI
- https://doi.org/10.1002/adfm.73798
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00