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Quantum dots pattern is essential for achieving full color Micro‐LED display. A novel bifunctional ligand, bis(2‐methacryloxyethyl) phosphate (BMEP), which simultaneously functions as both a surface ligand for perovskite quantum dots and a photopolymerizable monomer was used to develop high‐concentration (30 wt%) quantum dots photoresist. This photoresist was successfully employed in direct in situ photolithography to pattern high‐resolution RGB pixel arrays, providing a promising strategy for next‐generation AR/VR microdisplays. More details are discussed in the article by Qiu et al . on pages 649—655. image