Fabrication of Sapphire-Embedded Ultra-Wear-Resistant Metal Grids

To address poor wear resistance of surface metal grids for optical windows and low efficiency and poor uniformity of traditional embedded technologies, this study fabricates ultra-wear-resistant embedded metal grids on 180 mm × 180 mm × 8 mm sapphire via photolithography and large-area plasma etching. Etching grooves (depth about 300 nm) and depositing 135 nm silver (Ag) + 170 nm alumina (Al2O3) films, the grids exhibit transmittance 80.2%~80.9% (2~5 μm), wear resistance without damage, and reliable EMI shielding (Electromagnetic Interference Shielding) (3~18 GHz), offering a scalable solution for harsh-environment optoelectronic windows. The embedded structure integrates high transmittance, ultra-wear resistance, and reliable EMI shielding, addressing the core demands of optoelectronic windows in aerospace, outdoor monitoring, and other harsh environments where durability and stability are critical. The key innovation lies in the optimized integration of large-area plasma etching and low-temperature electron beam deposition, achieving precise control of groove depth uniformity (<4%) and transmittance uniformity (<1%) on high-hardness sapphire substrates, which overcomes the trade-off between efficiency and uniformity in traditional embedded technologies. Future applications include high-performance optical windows for airborne surveillance systems, space-borne optoelectronic devices, and harsh-environment industrial monitoring equipment, with potential extension to other high-hardness dielectric substrates.