VLPred: Accelerated Endurance Prediction Platform enabled by AI Surrogates

We present a fully integrated AI-driven framework for rapid endurance prediction in NVDRAM ferroelectric capacitors. Endurance testing is one of the most time- and resource-intensive steps in memory characterization, often requiring up to 10¹<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> cycles per device. To overcome the scarcity of endurance training data, we propose an experimentally calibrated synthetic data generation pipeline using kinetic Monte Carlo (kMC) simulations in Ginestra™, seeded with experimentally extracted defect parameters. We train a transformer-based AI surrogate using this high-fidelity dataset, achieving an R<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> of 0.992 and enabling ~10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</sup>x speedup in defect evolution prediction. The surrogate generates large-scale synthetic datasets by sampling initial defect profiles, which are then used to train a hybrid multi-layer perceptron (MLP)-attention model that maps early-life defect characteristics to Weibull endurance distributions. This final endurance prediction model achieves strong agreement with ground truth Weibull parameters, with R<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> values of >0.98 for η and ~0.9 for β, demonstrating its reliability in capturing endurance distribution characteristics. Wafer-scale prediction of breakdown distributions is demonstrated in one-shot, reducing characterization time by over 10 orders of magnitude. This framework enables scalable, high-throughput reliability screening for ferroelectric memory technologies.

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Published
2025-12-06
DOI
https://doi.org/10.1109/iedm50572.2025.11353672
Primary Topic
Ferroelectric and Negative Capacitance Devices
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article
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article

VLPred: Accelerated Endurance Prediction Platform enabled by AI Surrogates

Luca Larcher, Enrico Piccinini, Gaurav Thareja, Sheel Nidhan et al.
Ferroelectric and Negative Capacitance Devices
article

VLPred: Accelerated Endurance Prediction Platform enabled by AI Surrogates

Luca Larcher, Enrico Piccinini, Gaurav Thareja, Sheel Nidhan, Kaustubh Tangsali, Priyankka Gundlapudi Ravikumar, Surya Kalidindi, King C. Li, Zekai Wang, Prasanna Venkatesan, Yiyi Wang, Hari Jayasankar, Suman Datta, Andrea Padovani, Janaki Vamaraju, Ram Cherukuri, Asif Khan, Mohammad Nabian, Prakhar Mathur, Khandekar Akif Aabrar, Riccardo Foiera, Roman Gafiteanu
article en

Abstract

We present a fully integrated AI-driven framework for rapid endurance prediction in NVDRAM ferroelectric capacitors. Endurance testing is one of the most time- and resource-intensive steps in memory characterization, often requiring up to 10¹<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> cycles per device. To overcome the scarcity of endurance training data, we propose an experimentally calibrated synthetic data generation pipeline using kinetic Monte Carlo (kMC) simulations in Ginestra™, seeded with experimentally extracted defect parameters. We train a transformer-based AI surrogate using this high-fidelity dataset, achieving an R<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> of 0.992 and enabling ~10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</sup>x speedup in defect evolution prediction. The surrogate generates large-scale synthetic datasets by sampling initial defect profiles, which are then used to train a hybrid multi-layer perceptron (MLP)-attention model that maps early-life defect characteristics to Weibull endurance distributions. This final endurance prediction model achieves strong agreement with ground truth Weibull parameters, with R<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> values of >0.98 for η and ~0.9 for β, demonstrating its reliability in capturing endurance distribution characteristics. Wafer-scale prediction of breakdown distributions is demonstrated in one-shot, reducing characterization time by over 10 orders of magnitude. This framework enables scalable, high-throughput reliability screening for ferroelectric memory technologies.

Georgia Institute of Technology (US), UniCredit (Italy) (IT), Applied Materials (United States) (US), Nvidia (United States) (US)
Openalex Percentile: Top 37%
Ferroelectric and Negative Capacitance Devices
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