Electron Beam Manipulation on the Moiré Superlattice of Bilayer WS <sub>2</sub>
The moiré superlattice in twisted transition metal dichalcogenides (TMDCs) offers a versatile platform for exploring electronic properties and correlated quantum phenomena. However, conventional fabrication methods using transfer and stacking techniques suffer from interfacial contamination and limited scalability. Here, we introduce an <i>in situ</i> focused electron beam irradiation approach to dynamically manipulate and characterize the moiré superlattice in bilayer 2<i>H</i>-WS<sub>2</sub> in TEM. We achieve real-time moiré pattern control, enabling precise twist angle adjustments (6-10°). Prolonged irradiation induces displacement of tungsten (W) and sulfur (S) atoms from the moiré superlattice, which migrate to heal vacancies in adjacent monolayers, ultimately collapsing the superlattice into a WS<sub>2</sub> monolayer and revealing an unexpected atomic-scale self-repair mechanism. This technique advances the study of twistronics in 2D quantum materials by providing a pathway for atomically precise engineering of moiré-driven electronic states while highlighting the potential of electron beam lithography (EBL) for the controllable fabrication of moiré devices.
Authors
- Zeng Xl
- Dong Zhang (ORCID: https://orcid.org/0000-0002-6522-1918)
- Guanghui Yu
- Yuan Hu
- Kecheng Cao
- Jun Li
- Chuang Tian
Institutions
- Dongguan University of Technology (CN)
- ShanghaiTech University (CN)
- Institute of Molecular Functional Materials (CN)
- Shanghai Institute of Microsystem and Information Technology (CN)
- Academia Sinica (TW)
Publication Details
- Journal
- Nano Letters
- Published
- 2026-01-30
- DOI
- https://doi.org/10.1021/acs.nanolett.5c05946
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00