Impedance modeling of in-vacuum undulator with Gaussian process

The impedance of in-vacuum undulators (IVUs) significantly affect the broadband impedance and, consequently, the beam dynamics in storage rings. During the IVU design phase, numerous iterative discussions between physicists and engineers are required, often involving extensive simulations of the complete 3D geometry, a few meters long, using limited computational resources. In this paper, we propose training a Gaussian process model with limited simulation data to emulate the physical model. We compare the predictions of the trained model to the simulation data and explore its application in optimizing the IVU design.

Authors

Publication Details

Journal
JACOW
Published
2026-01-29
DOI
https://doi.org/10.18429/jacow-napac2025-mop102
Primary Topic
Particle Accelerators and Free-Electron Lasers
Type
article
Field-Weighted Citation Impact
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article

Impedance modeling of in-vacuum undulator with Gaussian process

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JACOW
Particle Accelerators and Free-Electron Lasers
article

Impedance modeling of in-vacuum undulator with Gaussian process

Michael Seegitz, Aamna Khan, Victor Smaluk, Minghao Song, Guimei Wang
article en

Abstract

The impedance of in-vacuum undulators (IVUs) significantly affect the broadband impedance and, consequently, the beam dynamics in storage rings. During the IVU design phase, numerous iterative discussions between physicists and engineers are required, often involving extensive simulations of the complete 3D geometry, a few meters long, using limited computational resources. In this paper, we propose training a Gaussian process model with limited simulation data to emulate the physical model. We compare the predictions of the trained model to the simulation data and explore its application in optimizing the IVU design.

JACOW
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Particle Accelerators and Free-Electron Lasers
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