Fabrication of a Hybrid Structure using Photosensitive Polyimide and Nanoimprinting

The moth-eye structure is employed in biomimetics and exhibits anti-reflection properties and enhanced wettability. The moth-eye structure is lined with nanopillars and has various industrial applications requiring the prevention of light reflection from surfaces. In this study, moth-eye structures were fabricated on a photosensitive polyimide (PI) surface and used as a mold to replicate moth-eye structures by performing ultraviolet nanoimprint lithography (UV-NIL). In addition, hybrid structures were fabricated using micropatterned photosensitive PI with a moth-eye structure. Micropatterns for the photosensitive PI were fabricated using photolithography. The moth-eye structure was formed by irradiating the PI surface with an oxygen-ion beam. The reflection of the moth-eye-structured PI and the replicated moth-eye structure was 0.5% at visible-light wavelengths. A micropatterned PI mold with a moth-eye structure was also fabricated and replicated using UV-NIL. The replicated pattern retained the inverted hybrid structure.

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Publication Details

Journal
Journal of Photopolymer Science and Technology
Published
2025-12-26
DOI
https://doi.org/10.2494/photopolymer.38.377
Primary Topic
Advanced optical system design
Type
article
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article

Fabrication of a Hybrid Structure using Photosensitive Polyimide and Nanoimprinting

Yoritaka Danjo, Jun Taniguchi
Journal of Photopolymer Science and Technology
Advanced optical system design
article

Fabrication of a Hybrid Structure using Photosensitive Polyimide and Nanoimprinting

Yoritaka Danjo, Jun Taniguchi
article en

Abstract

The moth-eye structure is employed in biomimetics and exhibits anti-reflection properties and enhanced wettability. The moth-eye structure is lined with nanopillars and has various industrial applications requiring the prevention of light reflection from surfaces. In this study, moth-eye structures were fabricated on a photosensitive polyimide (PI) surface and used as a mold to replicate moth-eye structures by performing ultraviolet nanoimprint lithography (UV-NIL). In addition, hybrid structures were fabricated using micropatterned photosensitive PI with a moth-eye structure. Micropatterns for the photosensitive PI were fabricated using photolithography. The moth-eye structure was formed by irradiating the PI surface with an oxygen-ion beam. The reflection of the moth-eye-structured PI and the replicated moth-eye structure was 0.5% at visible-light wavelengths. A micropatterned PI mold with a moth-eye structure was also fabricated and replicated using UV-NIL. The replicated pattern retained the inverted hybrid structure.

Journal of Photopolymer Science and TechnologyVol. 38(5)
Tokyo University of Science (JP)
Openalex Percentile: Top 39%
Advanced optical system design
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Fabrication of a Hybrid Structure using Photosensitive Polyimide and Nanoimprinting — Yoritaka Danjo, Jun Taniguchi · Journal of Photopolymer Science and Technology (2025) | TGRS Research Map | TGRS