A Novel Low-Voltage-Based Methodology for Short-Circuit Withstand Time Screening of Commercial 4H-SiC MOSFETs
With the rapid advancement of silicon carbide technology, device reliability has emerged as a critical concern for high-performance power electronics applications. Among various reliability challenges, the limited short-circuit withstand time (SCWT) of SiC MOSFETs, coupled with significant device-to-device variation, poses a serious risk, as it can lead to catastrophic field failures. In addition, established short-circuit screening technique utilizes high-voltage and high-stress condition that may degrade the long-term reliability of otherwise good devices. Hence, this work proposes a novel short-circuit screening methodology employing lower voltages and verifies it using commercial 1.2 kV 4H-SiC MOSFETs. The proposed approach can remove devices with lower SCWT while minimizing electrical and thermal overstress during screening. The results indicate that the proposed low-voltage screening technique offers a safe, repeatable, and reliable alternative to conventional short-circuit screening method, making it well suited for practical manufacturing, leading to system-level reliability enhancement in SiC-based power electronics applications.
Authors
- Atsushi Shimbori (ORCID: https://orcid.org/0000-0003-3307-2775)
- Michael Jin (ORCID: https://orcid.org/0000-0001-5182-2926)
- Monikuntala Bhattacharya (ORCID: https://orcid.org/0000-0002-0878-0975)
- Hengyu Yu (ORCID: https://orcid.org/0000-0002-3299-8106)
- Shiva Houshmand (ORCID: https://orcid.org/0000-0003-0779-3595)
- Marvin H. White
Institutions
- Ford Motor Company (Czechia) (CZ)
- The Ohio State University (US)
Publication Details
- Journal
- Electronics
- Published
- 2026-01-29
- DOI
- https://doi.org/10.3390/electronics15030579
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00