Broadband Sub-Micron Moth-Eye Anti-Reflection Coatings on Silicon for Wafer-Level CMOS–SOI–MEMS Thermal Infrared Sensors

Silicon windows in wafer-level packaged LWIR sensors suffer ~30% Fresnel reflection per interface, limiting optical throughput and detector sensitivity. We present an end-to-end design, fabrication, and validation framework for CMOS-compatible moth-eye anti-reflection coatings patterned directly on silicon wafers. Our approach integrates the effective medium theory, a transfer matrix analysis, full-wave FDTD simulations, and experimental Fourier-transform infrared (FTIR) measurements to optimize subwavelength pillar arrays for broadband (8-14 μm) and angle-tolerant performance. Fabricated structures demonstrate a 46.7% responsivity boost in CMOS-SOI-MEMS thermal sensors compared to bare silicon windows, while simulations predict up to 85.1% transmission and 57.1% responsivity enhancement for double-sided patterning. These results establish moth-eye metasurfaces as a scalable, CMOS-compatible solution for next-generation wafer-level processing and packaging infrared sensing platforms, transforming optical improvements into measurable electrical performance gains. The contribution of this work is the end-to-end framework for designing moth-eye wafer level processing and packaging for "real-life" CMOS-compatible infrared sensors manufacturing.

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Publication Details

Journal
Micromachines
Published
2026-01-28
DOI
https://doi.org/10.3390/mi17020170
Primary Topic
Transition Metal Oxide Nanomaterials
Type
article
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article

Broadband Sub-Micron Moth-Eye Anti-Reflection Coatings on Silicon for Wafer-Level CMOS–SOI–MEMS Thermal Infrared Sensors

Moshe Avraham, Yael Nemirovsky
Micromachines
Transition Metal Oxide Nanomaterials
article

Broadband Sub-Micron Moth-Eye Anti-Reflection Coatings on Silicon for Wafer-Level CMOS–SOI–MEMS Thermal Infrared Sensors

Moshe Avraham, Yael Nemirovsky
article en

Abstract

Silicon windows in wafer-level packaged LWIR sensors suffer ~30% Fresnel reflection per interface, limiting optical throughput and detector sensitivity. We present an end-to-end design, fabrication, and validation framework for CMOS-compatible moth-eye anti-reflection coatings patterned directly on silicon wafers. Our approach integrates the effective medium theory, a transfer matrix analysis, full-wave FDTD simulations, and experimental Fourier-transform infrared (FTIR) measurements to optimize subwavelength pillar arrays for broadband (8-14 μm) and angle-tolerant performance. Fabricated structures demonstrate a 46.7% responsivity boost in CMOS-SOI-MEMS thermal sensors compared to bare silicon windows, while simulations predict up to 85.1% transmission and 57.1% responsivity enhancement for double-sided patterning. These results establish moth-eye metasurfaces as a scalable, CMOS-compatible solution for next-generation wafer-level processing and packaging infrared sensing platforms, transforming optical improvements into measurable electrical performance gains. The contribution of this work is the end-to-end framework for designing moth-eye wafer level processing and packaging for "real-life" CMOS-compatible infrared sensors manufacturing.

MicromachinesVol. 17(2)
Technion – Israel Institute of Technology (IL)
Openalex Percentile: Top 74%
Transition Metal Oxide Nanomaterials
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Broadband Sub-Micron Moth-Eye Anti-Reflection Coatings on Silicon for Wafer-Level CMOS–SOI–MEMS Thermal Infrared Sensors — Moshe Avraham, Yael Nemirovsky · Micromachines (2026) | TGRS Research Map | TGRS