Gradual Band Evolution at the Electron-Correlated Interface in a Laterally Hetero-Epitaxial Two-Dimensional Heterostructure

As a fundamental characteristic, interfacial band evolution exerts a profound impact on the performance of heterostructures, especially the two-dimensional (2D) lateral heterostructure, which is anticipated with its excellent interfacial properties. Despite intensive reports on semiconductors, studies on 2D electron-correlated heterostructures, which hold big expectations for quantum devices, remain in their early stages on limited materials, hindered by the lack of a controllable fabrication strategy. Here, we report the laterally epitaxial fabrication of the 1T-NbSe<sub>2</sub>/1T-VSe<sub>2</sub> heterostructure and the visualization of the band evolution at its electron-correlated interface. With designed parameters, the 2D VSe<sub>2</sub> was successfully grown adjacent to the presynthesized 1T-NbSe<sub>2</sub>. Atomic-resolution characterizations reveal a well-aligned atomic lattice at the interface. A continuous band profile, particularly the gentle interfacial evolution of the Mott-Hubbard bands, was visualized at the interface, showing the gradual band bending of the upper Hubbard band (∼0.026 eV) and a shrinkage of the Mott-Hubbard gap from 0.124 eV with a decay length of ∼2.4 nm. Our work offers an essential strategy for the fabrication and visualization of 2D electron-correlated heterostructures, laying the groundwork for their fundamental study and future applications.

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Journal
The Journal of Physical Chemistry Letters
Published
2026-01-22
DOI
https://doi.org/10.1021/acs.jpclett.5c03549
Primary Topic
2D Materials and Applications
Type
article
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article

Gradual Band Evolution at the Electron-Correlated Interface in a Laterally Hetero-Epitaxial Two-Dimensional Heterostructure

Zhixin Hu, Xiangshi Ren, Genyu Hu, J. Li et al.
The Journal of Physical Chemistry Letters
2D Materials and Applications
article

Gradual Band Evolution at the Electron-Correlated Interface in a Laterally Hetero-Epitaxial Two-Dimensional Heterostructure

Zhixin Hu, Xiangshi Ren, Genyu Hu, J. Li, Shihao Hu, Tianyu Dai, Yuxuan Luo, Xinyu Wu, Yan Shao, Songdi Liu, Ziqiang Xu, Yun Zhang, Wuyi Gao, Yusen Wang, Tianshu Zhang
article en

Abstract

As a fundamental characteristic, interfacial band evolution exerts a profound impact on the performance of heterostructures, especially the two-dimensional (2D) lateral heterostructure, which is anticipated with its excellent interfacial properties. Despite intensive reports on semiconductors, studies on 2D electron-correlated heterostructures, which hold big expectations for quantum devices, remain in their early stages on limited materials, hindered by the lack of a controllable fabrication strategy. Here, we report the laterally epitaxial fabrication of the 1T-NbSe<sub>2</sub>/1T-VSe<sub>2</sub> heterostructure and the visualization of the band evolution at its electron-correlated interface. With designed parameters, the 2D VSe<sub>2</sub> was successfully grown adjacent to the presynthesized 1T-NbSe<sub>2</sub>. Atomic-resolution characterizations reveal a well-aligned atomic lattice at the interface. A continuous band profile, particularly the gentle interfacial evolution of the Mott-Hubbard bands, was visualized at the interface, showing the gradual band bending of the upper Hubbard band (∼0.026 eV) and a shrinkage of the Mott-Hubbard gap from 0.124 eV with a decay length of ∼2.4 nm. Our work offers an essential strategy for the fabrication and visualization of 2D electron-correlated heterostructures, laying the groundwork for their fundamental study and future applications.

The Journal of Physical Chemistry LettersVol. 17(5)
Beijing Institute of Technology (CN), Tianjin University of Technology (CN), Guizhou Normal University (CN), Tianjin University (CN), Integrated Optoelectronics (Norway) (NO)
Openalex Percentile: Top 79%
2D Materials and Applications
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