Magnetoelectric properties at the Co/AlN(0001) interface

AlN nitride is a large-band-gap polar material that has gained interest due to its ability to become ferroelectric and its compatibility with Si- and GaN-based technologies. This compound could, therefore, be a good candidate to design new artificial multiferroics if combined with a ferromagnetic electrode. We performed first-principles calculations to investigate the set up of the magnetoelectric coupling at the Co/AlN(0001) interface. Our results describe a complex interfacial atomic structure with variable local magnetic properties as a function of the atom alignment. We predict an average variation of interface spin magnetization, when the polarization is reversed, of 3.83 ${\ensuremath{\mu}}_{\text{B}} {\mathrm{nm}}^{\ensuremath{-}2}$, close to the values already reported in the literature at metal/oxide interfaces. This confirms the potential of this AlN-based ferroelectric compound to be used in future voltage-controlled spintronic devices.

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Publication Details

Journal
Physical Review Materials
Published
2026-01-23
DOI
https://doi.org/10.1103/vm5q-xbrm
Primary Topic
Multiferroics and related materials
Type
article
Field-Weighted Citation Impact
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article

Magnetoelectric properties at the Co/AlN(0001) interface

Charles Paillard, Rémi Arras, Laurent Bellaiche
Physical Review Materials
Multiferroics and related materials
article

Magnetoelectric properties at the Co/AlN(0001) interface

Charles Paillard, Rémi Arras, Laurent Bellaiche
article en

Abstract

AlN nitride is a large-band-gap polar material that has gained interest due to its ability to become ferroelectric and its compatibility with Si- and GaN-based technologies. This compound could, therefore, be a good candidate to design new artificial multiferroics if combined with a ferromagnetic electrode. We performed first-principles calculations to investigate the set up of the magnetoelectric coupling at the Co/AlN(0001) interface. Our results describe a complex interfacial atomic structure with variable local magnetic properties as a function of the atom alignment. We predict an average variation of interface spin magnetization, when the polarization is reversed, of 3.83 ${\ensuremath{\mu}}_{\text{B}} {\mathrm{nm}}^{\ensuremath{-}2}$, close to the values already reported in the literature at metal/oxide interfaces. This confirms the potential of this AlN-based ferroelectric compound to be used in future voltage-controlled spintronic devices.

Physical Review MaterialsVol. 10(1)
Zhejiang A & F University (CN), Tel Aviv University (IL), Université Fédérale de Toulouse Midi-Pyrénées (FR), Université Paris-Saclay (FR), Weatherford College (US), CentraleSupélec (FR), Centre d’Élaboration de Matériaux et d’Études Structurales (FR), University of Arkansas at Fayetteville (US)
Openalex Percentile: Top 80%
Multiferroics and related materials
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