Mechanism analysis and protection design of GaN HEMTs induced by high-power microwave pulse

This study investigates the damage mechanisms induced by HPM stress in GaN HEMTs using Sentaurus TCAD numerical simulations and proposes corresponding multi-scale protection strategies. A comprehensive simulation model of a depletion-mode GaN HEMT was established. The analysis of the evolution of internal electric field, current density, and temperature profiles under HPM stress reveals that the failure mechanism is primarily attributed to an electro-thermal positive feedback loop between the gate and source, leading to thermal accumulation and eventual thermal breakdown when the lattice temperature reaches the melting point of GaN. Based on this understanding, protection strategies were developed through structural optimization. The results demonstrate that moderately increasing the gate length (0.25-0.3<i>μ</i>m), extending the field plate length (1.85-2.25<i>μ</i>m), and optimizing the channel layer thickness (0.4-0.6<i>μ</i>m) effectively reduce the internal electric field and current density, thereby mitigating thermal accumulation and enhancing HPM resilience without significantly compromising DC performance.

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Publication Details

Journal
Nanotechnology
Published
2026-01-22
DOI
https://doi.org/10.1088/1361-6528/ae3c1b
Primary Topic
Pulsed Power Technology Applications
Type
article
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article

Mechanism analysis and protection design of GaN HEMTs induced by high-power microwave pulse

Dong Xing, Hongxia Liu, Xingjun Liu, Chang Liu et al.
Nanotechnology
Pulsed Power Technology Applications
article

Mechanism analysis and protection design of GaN HEMTs induced by high-power microwave pulse

Dong Xing, Hongxia Liu, Xingjun Liu, Chang Liu, Mengwei Su
article en

Abstract

This study investigates the damage mechanisms induced by HPM stress in GaN HEMTs using Sentaurus TCAD numerical simulations and proposes corresponding multi-scale protection strategies. A comprehensive simulation model of a depletion-mode GaN HEMT was established. The analysis of the evolution of internal electric field, current density, and temperature profiles under HPM stress reveals that the failure mechanism is primarily attributed to an electro-thermal positive feedback loop between the gate and source, leading to thermal accumulation and eventual thermal breakdown when the lattice temperature reaches the melting point of GaN. Based on this understanding, protection strategies were developed through structural optimization. The results demonstrate that moderately increasing the gate length (0.25-0.3<i>μ</i>m), extending the field plate length (1.85-2.25<i>μ</i>m), and optimizing the channel layer thickness (0.4-0.6<i>μ</i>m) effectively reduce the internal electric field and current density, thereby mitigating thermal accumulation and enhancing HPM resilience without significantly compromising DC performance.

NanotechnologyVol. 37(5)
Xidian University (CN), China Electronic Product Reliability and Environmental Test Institute (CN)
Affordable and clean energy
Openalex Percentile: Top 80%
Pulsed Power Technology Applications
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Mechanism analysis and protection design of GaN HEMTs induced by high-power microwave pulse — Dong Xing, Hongxia Liu, et al. · Nanotechnology (2026) | TGRS Research Map | TGRS