Structures and Adsorption Behavior on N-Polar GaN(0001) Surface with Steps and Kinks: A DFT Study

Using density functional calculations, we systematically examine the adsorption characteristics of Ga and N atoms on stepped and kinked vicinal GaN(0001̅) surfaces under metal–organic vapor-phase epitaxy (MOVPE) growth conditions. The calculations reveal that surface reconstruction exerts a pronounced influence on the adsorption characteristics of Ga and N adatoms in the vicinity of step edges and kinks. In particular, we find that both Ga and N adatoms can be incorporated at kinks and step edges, in clear contrast to the behavior on conventional Ga-polar GaN(0001) surface. These findings provide valuable insights into the atomistic mechanisms governing the epitaxial growth of N-polar GaN, thereby advancing our understanding of the surface processes that determine crystal quality and morphology during the MOVPE growth.

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Publication Details

Journal
Crystal Growth & Design
Published
2026-01-22
DOI
https://doi.org/10.1021/acs.cgd.5c01483
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
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article

Structures and Adsorption Behavior on N-Polar GaN(0001) Surface with Steps and Kinks: A DFT Study

Takahiro Kawamura, T. Akiyama, T. Tahara
Crystal Growth & Design
GaN-based semiconductor devices and materials
article

Structures and Adsorption Behavior on N-Polar GaN(0001) Surface with Steps and Kinks: A DFT Study

Takahiro Kawamura, T. Akiyama, T. Tahara
article en

Abstract

Using density functional calculations, we systematically examine the adsorption characteristics of Ga and N atoms on stepped and kinked vicinal GaN(0001̅) surfaces under metal–organic vapor-phase epitaxy (MOVPE) growth conditions. The calculations reveal that surface reconstruction exerts a pronounced influence on the adsorption characteristics of Ga and N adatoms in the vicinity of step edges and kinks. In particular, we find that both Ga and N adatoms can be incorporated at kinks and step edges, in clear contrast to the behavior on conventional Ga-polar GaN(0001) surface. These findings provide valuable insights into the atomistic mechanisms governing the epitaxial growth of N-polar GaN, thereby advancing our understanding of the surface processes that determine crystal quality and morphology during the MOVPE growth.

Crystal Growth & DesignVol. 26(3)
Mie University (JP), Future Earth (CA), Graduate School USA (US)
Openalex Percentile: Top 77%
GaN-based semiconductor devices and materials
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Structures and Adsorption Behavior on N-Polar GaN(0001) Surface with Steps and Kinks: A DFT Study — Takahiro Kawamura, T. Akiyama, et al. · Crystal Growth & Design (2026) | TGRS Research Map | TGRS