Structures and Adsorption Behavior on N-Polar GaN(0001) Surface with Steps and Kinks: A DFT Study
Using density functional calculations, we systematically examine the adsorption characteristics of Ga and N atoms on stepped and kinked vicinal GaN(0001̅) surfaces under metal–organic vapor-phase epitaxy (MOVPE) growth conditions. The calculations reveal that surface reconstruction exerts a pronounced influence on the adsorption characteristics of Ga and N adatoms in the vicinity of step edges and kinks. In particular, we find that both Ga and N adatoms can be incorporated at kinks and step edges, in clear contrast to the behavior on conventional Ga-polar GaN(0001) surface. These findings provide valuable insights into the atomistic mechanisms governing the epitaxial growth of N-polar GaN, thereby advancing our understanding of the surface processes that determine crystal quality and morphology during the MOVPE growth.
Authors
- Takahiro Kawamura (ORCID: https://orcid.org/0000-0002-6024-0634)
- T. Akiyama
- T. Tahara
Institutions
- Mie University (JP)
- Future Earth (CA)
- Graduate School USA (US)
Publication Details
- Journal
- Crystal Growth & Design
- Published
- 2026-01-22
- DOI
- https://doi.org/10.1021/acs.cgd.5c01483
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00