Weak antilocalization effect on Bi2Te3/CdTe heterostructures grown on glass substrate by molecular beam epitaxy

This work presents the experimental observation of the weak antilocalization effect (WAL) in Bi2Te3 samples covered with CdTe grown on glass and GaAs (001) substrates using molecular beam epitaxy. We show that the amplitude of WAL is very close in both samples, which opens the possibility of the implementation of a low-cost device that operates via spin transport using a glass substrate. The experimental data were analyzed using the Hikami–Larkin–Nagaoka model, which provided the important parameters of dephasing and spin–orbit scattering lengths. Also, the structural characterization has evidenced that the samples present almost the same crystalline quality, indicating that van der Waals epitaxy can produce good quality Bi2Te3 layers independent of the chosen substrate.

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Publication Details

Journal
Journal of Applied Physics
Published
2026-01-21
DOI
https://doi.org/10.1063/5.0311727
Primary Topic
Topological Materials and Phenomena
Type
article
Field-Weighted Citation Impact
0.00

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article

Weak antilocalization effect on Bi2Te3/CdTe heterostructures grown on glass substrate by molecular beam epitaxy

S. de Castro, Leonarde N. Rodrigues, Bráulio S. Archanjo, Wesley F. Inoch et al.
Journal of Applied Physics
Topological Materials and Phenomena
article

Weak antilocalization effect on Bi2Te3/CdTe heterostructures grown on glass substrate by molecular beam epitaxy

S. de Castro, Leonarde N. Rodrigues, Bráulio S. Archanjo, Wesley F. Inoch, Deriky L. de Queiroz, M. L. Peres
article en

Abstract

This work presents the experimental observation of the weak antilocalization effect (WAL) in Bi2Te3 samples covered with CdTe grown on glass and GaAs (001) substrates using molecular beam epitaxy. We show that the amplitude of WAL is very close in both samples, which opens the possibility of the implementation of a low-cost device that operates via spin transport using a glass substrate. The experimental data were analyzed using the Hikami–Larkin–Nagaoka model, which provided the important parameters of dephasing and spin–orbit scattering lengths. Also, the structural characterization has evidenced that the samples present almost the same crystalline quality, indicating that van der Waals epitaxy can produce good quality Bi2Te3 layers independent of the chosen substrate.

Journal of Applied PhysicsVol. 139(3)
Universidade Federal de Viçosa (BR), Instituto Nacional de Metrologia, Qualidade e Tecnologia (BR), Universidade Federal de Itajubá (BR)
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior, Conselho Nacional de Desenvolvimento Científico e Tecnológico, Fundação de Amparo à Pesquisa do Estado de Minas Gerais
Openalex Percentile: Top 80%
Topological Materials and Phenomena
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