A CMOS-Compatible Heterogeneous 3-D Integration Platform for Silicon Nanoelectromechanical Switches
Nanoelectromechanical (NEM) switches have near vertical turn-off transient, zero off-state leakage, and non-volatile behavior, ideal qualities for low power computing and memory applications. To realize this potential, large-scale integration of NEM switches is required. Here we introduce a three-dimensional (3-D) heterogeneous integration platform that leverages a standard silicon-on-insulator (SOI) CMOS foundry process, combined with post-processing of the foundry wafers to integrate silicon NEM switches. Within this platform, we seamlessly integrated both volatile 3-terminal (3-T) and non-volatile 7-terminal (7-T) NEM switches. We demonstrate successful electrical programming and reprogramming of both switch types, validating the platform’s functionality and its potential for constructing densely integrated NEM switch-based logic circuits and non-volatile memories.
Authors
- Simon J. Bleiker (ORCID: https://orcid.org/0000-0002-4867-0391)
- Mukesh Kulsreshath (ORCID: https://orcid.org/0000-0002-2770-8493)
- Dinesh Pamunuwa (ORCID: https://orcid.org/0000-0002-4838-7932)
- Kristinn B. Gylfason (ORCID: https://orcid.org/0000-0001-9008-8402)
- Stefan Ernst (ORCID: https://orcid.org/0000-0002-2095-769X)
- Elliott Worsey
- Shyamprasad N. Raja (ORCID: https://orcid.org/0000-0002-2278-1368)
- Christian Reich (ORCID: https://orcid.org/0000-0001-6528-8410)
- Frank Niklaus (ORCID: https://orcid.org/0000-0002-0525-8647)
- August Djuphammar
- Qi Tang
- Yingying Li
Institutions
- X-Fab (Germany) (DE)
- University of Bristol (GB)
- KTH Royal Institute of Technology (SE)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2026-01-19
- DOI
- https://doi.org/10.1109/led.2026.3655495
- Primary Topic
- Mechanical and Optical Resonators
- Type
- article
- Field-Weighted Citation Impact
- 0.00