III-V Heterostructure Plasma Etching for Low Cost and High Efficiency Photonic Devices

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Journal
SPIRE - Sciences Po Institutional REpository
Published
2025-06-16
Primary Topic
Photonic and Optical Devices
Type
article
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article

III-V Heterostructure Plasma Etching for Low Cost and High Efficiency Photonic Devices

Karin Hinzer, Thomas Bidaud, Guillaume Gay, Mathieu de Lafontaine et al.
SPIRE - Sciences Po Institutional REpository
Photonic and Optical Devices
article

III-V Heterostructure Plasma Etching for Low Cost and High Efficiency Photonic Devices

Karin Hinzer, Thomas Bidaud, Guillaume Gay, Mathieu de Lafontaine, Maxime Darnon, Abdelatif Jaouad, Erwine Pargon, Vincent Aimez, Artur Turala, Simon Fafard, Camille Petit-Etienne, Christopher E. Valdivia
article en

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No abstract available for this paper.
SPIRE - Sciences Po Institutional REpository
Openalex Percentile: Top 39%
Photonic and Optical Devices
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III-V Heterostructure Plasma Etching for Low Cost and High Efficiency Photonic Devices — Karin Hinzer, Thomas Bidaud, et al. · SPIRE - Sciences Po Institutional REpository (2025) | TGRS Research Map | TGRS