Wet etching mechanisms of III-N materials under KOH

Authors

Lucas Jaloustre (ORCID: https://orcid.org/0009-0001-0827-8715)
Lucie Valéra (ORCID: https://orcid.org/0000-0002-3742-3563)
Gwénolé Jacopin (ORCID: https://orcid.org/0000-0003-0049-7195)
S. R. Sales De Mello
Erwine Pargon
Christophe Durand
Camille Petit-Etienne
Sebastien Labau

Publication Details

Journal: SPIRE - Sciences Po Institutional REpository
Published: 2025-06-16
Primary Topic: Plasma Diagnostics and Applications
Type: article
Field-Weighted Citation Impact: 0.00

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article

Wet etching mechanisms of III-N materials under KOH

Lucas Jaloustre, Lucie Valéra, Gwénolé Jacopin, S. R. Sales De Mello et al.

Jun 16, 2025

SPIRE - Sciences Po Institutional REpository

Plasma Diagnostics and Applications

article

Wet etching mechanisms of III-N materials under KOH

Lucas Jaloustre, Lucie Valéra, Gwénolé Jacopin, S. R. Sales De Mello, Erwine Pargon, Christophe Durand, Camille Petit-Etienne, Sebastien Labau

June 16, 2025article en

Abstract

No abstract available for this paper.

SPIRE - Sciences Po Institutional REpository

Openalex Percentile: Top 39%

Plasma Diagnostics and Applications

OpenAlex

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Wet etching mechanisms of III-N materials under KOH — Lucas Jaloustre, Lucie Valéra, et al. · SPIRE - Sciences Po Institutional REpository (2025) | TGRS Research Map | TGRS