InGaAs membrane plasmonic photodetector with Ni-InGaAs alloy integrated on Si waveguide
We propose III-V/Si hybrid plasmonic waveguide photodetector incorporating an InGaAs membrane. We confirmed that Ni-InGaAs alloy functions effectively as an electrode for a plasmonic waveguide. Utilizing Ni-InGaAs alloy enabled the integration of plasmonic waveguide photodetectors into the Si photonics platform through a simplified fabrication process. We achieved a responsivity of 0.13 A/W at 1 V with a dark current of 400 nA and confirmed a 32.1 Gbit/s clear eye diagram, demonstrating the potential for high speed InGaAs plasmonic photodetector in Si photonics.
Authors
- Yuto Miyatake
- Tomohiro Akazawa
- Taketoshi Nakayama
- Kentaro Komatsu
- Kasidit Toprasertpong
- Yosuke Wakita
- S. Monfray
- Hiroya Sakumoto
- Mitsuru Takenaka
- Chao Zhang
- Rui Tang
- Shinichi Takagi
- Frédéric Boeuf
Institutions
- STMicroelectronics (Czechia) (CZ)
- The University of Tokyo (JP)
Publication Details
- Journal
- Optics Express
- Published
- 2026-01-16
- DOI
- https://doi.org/10.1364/oe.586807
- Primary Topic
- Plasmonic and Surface Plasmon Research
- Type
- article
- Field-Weighted Citation Impact
- 0.00