Vanadium Dioxide Thin Films Deposited by ALD Using TDMAV and H₂O: Crystallization Kinetics for photonic applications

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SPIRE - Sciences Po Institutional REpository
Published
2025-11-19
Primary Topic
Transition Metal Oxide Nanomaterials
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article

Vanadium Dioxide Thin Films Deposited by ALD Using TDMAV and H₂O: Crystallization Kinetics for photonic applications

Florin Năstase, Manon Drob, Stéphane Calvez, Pascal Dubreuil
SPIRE - Sciences Po Institutional REpository
Transition Metal Oxide Nanomaterials
article

Vanadium Dioxide Thin Films Deposited by ALD Using TDMAV and H₂O: Crystallization Kinetics for photonic applications

Florin Năstase, Manon Drob, Stéphane Calvez, Pascal Dubreuil
article en

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SPIRE - Sciences Po Institutional REpository
Openalex Percentile: Top 45%
Transition Metal Oxide Nanomaterials
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Vanadium Dioxide Thin Films Deposited by ALD Using TDMAV and H₂O: Crystallization Kinetics for photonic applications — Florin Năstase, Manon Drob, et al. · SPIRE - Sciences Po Institutional REpository (2025) | TGRS Research Map | TGRS