High-performance dual-band silicon slow-light modulator for DWDM chip-scale applications
This paper presents a silicon slow-light modulator based on cascaded phase-shifted Bragg grating (PSBG) structures, which supports C/L dual-band modulation and demonstrates consistent wavelength channel performance across these bands. The modulator has an ultra-compact modulation length of only 201 µm, a normalized insertion loss of 5.3 dB, an electro-optic bandwidth of up to 85 GHz, and an OOK modulation speed of up to 128 Gbaud. Notably, it features a breakthrough in operational bandwidth, with a flat passband exceeding 20 nm in both C and L bands, and achieves an energy efficiency of 0.242 pJ/bit. The design integrates CMOS compatibility, small footprint, low insertion loss, high bandwidth, and extensive working wavelength range, providing an efficient solution for high-density wavelength division multiplexing (DWDM) chip-scale interconnects.
Authors
- Zanyun Zhang (ORCID: https://orcid.org/0000-0002-9782-8749)
- Qixin Wang (ORCID: https://orcid.org/0009-0005-8597-2160)
- Tianjun Liu
- Beiju Huang
- Kaixin Zhang
- Hao Jiang
- Wenjing Zhang
- Meixin Li
- xiaoqing lv
Institutions
- Tiangong University (CN)
- Institute of Microelectronics (CN)
- Institute of Semiconductors (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- Optics Express
- Published
- 2026-01-14
- DOI
- https://doi.org/10.1364/oe.579162
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00