The Influence of Low-Energy Ions Flow on the Homogeneity of Acrylic Emulsion Particle Distribution

In this article the influence of low-energy ions flow generated in the capacitively coupled radio-frequency (RF) discharge at intermediate pressure on the homogeneity of distribution and particle size of acrylic emulsion is shown. The homogeneity of particle distribution analyzed by the dynamic light scattering method. The influence of discharge power and the type of plasma-forming gas on the homogeneity of acrylic emulsion particle distribution is investigated. Capacitive discharge power varied from 300 to 850 W. This research found the optimal mode for increasing the homogeneity of particle distribution: discharge power—700 W, treatment time interval—10 min, plasma-forming gas—argon.

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Publication Details

Journal
High Energy Chemistry
Published
2025-12-01
DOI
https://doi.org/10.1134/s0018143925700705
Primary Topic
Plasma Applications and Diagnostics
Type
article
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article

The Influence of Low-Energy Ions Flow on the Homogeneity of Acrylic Emulsion Particle Distribution

I. I. Latfullin
High Energy Chemistry
Plasma Applications and Diagnostics
article

The Influence of Low-Energy Ions Flow on the Homogeneity of Acrylic Emulsion Particle Distribution

I. I. Latfullin
article en

Abstract

In this article the influence of low-energy ions flow generated in the capacitively coupled radio-frequency (RF) discharge at intermediate pressure on the homogeneity of distribution and particle size of acrylic emulsion is shown. The homogeneity of particle distribution analyzed by the dynamic light scattering method. The influence of discharge power and the type of plasma-forming gas on the homogeneity of acrylic emulsion particle distribution is investigated. Capacitive discharge power varied from 300 to 850 W. This research found the optimal mode for increasing the homogeneity of particle distribution: discharge power—700 W, treatment time interval—10 min, plasma-forming gas—argon.

High Energy ChemistryVol. 59(S2)
Kazan State Technological University (RU)
Affordable and clean energy
Openalex Percentile: Top 29%
Plasma Applications and Diagnostics
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