Discharge Plasma Parameters of Magnetron Sputtering System in Gas and Vacuum (Gasless) Operating Modes

We present the results of probe measurements of plasma parameters and ion mass-to-charge state of a DC magnetron sputtering system (MSS) in gas and vacuum (gasless) operating modes at operating pressures from 2 down to 0.05 mTorr. It is shown that, in comparison with the gas operating mode, the discharge plasma of the vacuum magnetron is characterized by higher values of electron temperature and plasma potential, along with the generation of multiply charged metal ions of the target material. This mode is also characterized by a higher degree of ionization of sputtered material and enhanced ion current density onto the substrate. The revealed differences may be useful for improving quality and properties of formed coatings.

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Publication Details

Journal
Bulletin of the Russian Academy of Sciences Physics
Published
2025-12-01
DOI
https://doi.org/10.1134/s1062873825714503
Primary Topic
Advanced Sensor Technologies Research
Type
article
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article

Discharge Plasma Parameters of Magnetron Sputtering System in Gas and Vacuum (Gasless) Operating Modes

A. A. Cherkasov, G. Yu. Yushkov, V. D. Gridilev, K. P. Savkin et al.
Bulletin of the Russian Academy of Sciences Physics
Advanced Sensor Technologies Research
article

Discharge Plasma Parameters of Magnetron Sputtering System in Gas and Vacuum (Gasless) Operating Modes

A. A. Cherkasov, G. Yu. Yushkov, V. D. Gridilev, K. P. Savkin, M. V. Shandrikov, A. S. Bugaev, S. S. Kovalsky
article en

Abstract

We present the results of probe measurements of plasma parameters and ion mass-to-charge state of a DC magnetron sputtering system (MSS) in gas and vacuum (gasless) operating modes at operating pressures from 2 down to 0.05 mTorr. It is shown that, in comparison with the gas operating mode, the discharge plasma of the vacuum magnetron is characterized by higher values of electron temperature and plasma potential, along with the generation of multiply charged metal ions of the target material. This mode is also characterized by a higher degree of ionization of sputtered material and enhanced ion current density onto the substrate. The revealed differences may be useful for improving quality and properties of formed coatings.

Bulletin of the Russian Academy of Sciences PhysicsVol. 89(S2)
Institute of High Current Electronics (RU)
Affordable and clean energy
Openalex Percentile: Top 40%
Advanced Sensor Technologies Research
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