Dopant-Free Ultra-Thin Spiro-OMeTAD Enables Near 30%-Efficient n–i–p Perovskite/Silicon Tandem Solar Cells
A major challenge for n-i-p structured perovskite/silicon tandem solar cells (TSCs) is the use of 2,2',7,7'-tetrakis[N,N-di(4-methoxyphenyl)amino]-9,9'-spirobifluorene (spiro-OMeTAD), a commonly used hole transport layer, which induces significant optical losses and consequently reduces device current. Herein, we propose an ultra-thin (10 nm) vacuum thermal evaporation (VTE)-deposited spiro-OMeTAD, coupled with a 2D/3D perovskite heterojunction, to simultaneously enhance the optical and electrical properties of n-i-p perovskite/silicon TSCs. Our results demonstrate that the 10-nm-thick spiro-OMeTAD layer significantly improves optical performance, achieving a 92.2% reduction in parasitic absorption and an 18.4% decrease in reflection losses. Additionally, the incorporation of the 2D/3D perovskite heterojunction facilitates improved molecular arrangement and enhanced surface uniformity of the ultrathin spiro-OMeTAD, leading to higher tolerance to interface defects and more efficient hole extraction. Consequently, n-i-p perovskite/silicon TSCs featuring ultrathin spiro-OMeTAD exhibit remarkable efficiencies of 29.73% (0.135 cm<sup>2</sup>) and 28.77% (28.25% certified efficiency, 1.012 cm<sup>2</sup>), along with improved stability.
Authors
- Zhiqin Ying (ORCID: https://orcid.org/0000-0003-2284-3247)
- Weichuang Yang (ORCID: https://orcid.org/0000-0003-3190-3651)
- Jichun Ye (ORCID: https://orcid.org/0000-0002-3901-7155)
- Zhenhai Yang (ORCID: https://orcid.org/0009-0008-7182-2753)
- Yuheng Zeng
- Xiangying Xue
- Xi Yang
Institutions
- NXP (Netherlands) (NL)
- Soochow University (CN)
- Research Institute of Semiconductor Devices (RU)
- Ningbo Institute of Industrial Technology (CN)
Publication Details
- Journal
- Nano-Micro Letters
- Published
- 2026-01-14
- DOI
- https://doi.org/10.1007/s40820-025-01962-3
- Citations
- 1
- Primary Topic
- Perovskite Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 21.93