Wafer-scale P-type MoS2 monolayers achieved via controllable niobium doping in metal-organic chemical vapor deposition
Molybdenum disulfide (MoS2), a prominent two-dimensional (2D) transition metal dichalcogenide (TMDC), offers significant potential for next-generation nanoelectronic and optoelectronic devices due to its tunable electronic properties and atomic-scale thickness. While n-type MoS2 has been extensively studied, achieving stable p-type MoS2 is equally critical for enabling complementary logic circuits and complementary metal-oxide-semiconductor (CMOS) technology based on 2D materials. However, p-type doping in MoS2 remains challenging due to difficulties in achieving uniform, scalable doping with precise control over electronic properties. In this work, we demonstrate the metal-organic chemical vapor deposition (MOCVD) growth of wafer-scale Nb-doped MoS2 films with substitutional incorporation of Nb atoms, achieving uniform p-type behavior with precise doping control. Our Nb-doped MoS2 films demonstrate a clear transition from n-type to p-type with increasing doping levels, placing them among the well-performing p-type MoS2 films reported to date. A thermodynamic-kinetic model is developed to simulate the substitution behavior of Nb atoms on the MoS2 surface, revealing a clear doping correlation governed by growth temperature and precursor pressure, and offering theoretical guidance for optimizing substitution efficiency. This study represents a significant advancement in fabricating scalable, wafer-scale 2D materials with controllable doping, paving the way for the integration of TMDCs into next-generation low-power, flexible, and transparent electronics. Achieving stable p-type doping in MoS₂ is crucial for enabling complementary logic circuits but remains substantially more challenging than n-type doping. Here, the authors demonstrate metal-organic chemical vapor deposition growth of wafer-scale Nb-doped MoS₂ films with uniform p-type behavior, offering a thermodynamic-kinetic model for doping control, thereby advancing scalable 2D materials for low-power, flexible electronics.
Authors
- Ruoyu Zhong (ORCID: https://orcid.org/0000-0003-0433-0923)
- J. Lu (ORCID: https://orcid.org/0009-0006-3987-9616)
- Mengjiao Li
- Zhiwei Yao
- Tan Luo
- Lei Zhang
- Le Zheng
- Jing Zhang
- Jianhua Zhang
- Yuming Chen
- Zhenyu Wang
- Yiou Huang
- Zheng Zhu
Institutions
- Shanghai University (CN)
- Chinese Academy of Sciences (CN)
- Institute of Semiconductors (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- Communications Materials
- Published
- 2026-01-08
- DOI
- https://doi.org/10.1038/s43246-025-01065-x
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Natural Science Foundation of Shanghai
- National Natural Science Foundation of China
- National Key Research and Development Program of China