Wafer-scale P-type MoS2 monolayers achieved via controllable niobium doping in metal-organic chemical vapor deposition

Molybdenum disulfide (MoS2), a prominent two-dimensional (2D) transition metal dichalcogenide (TMDC), offers significant potential for next-generation nanoelectronic and optoelectronic devices due to its tunable electronic properties and atomic-scale thickness. While n-type MoS2 has been extensively studied, achieving stable p-type MoS2 is equally critical for enabling complementary logic circuits and complementary metal-oxide-semiconductor (CMOS) technology based on 2D materials. However, p-type doping in MoS2 remains challenging due to difficulties in achieving uniform, scalable doping with precise control over electronic properties. In this work, we demonstrate the metal-organic chemical vapor deposition (MOCVD) growth of wafer-scale Nb-doped MoS2 films with substitutional incorporation of Nb atoms, achieving uniform p-type behavior with precise doping control. Our Nb-doped MoS2 films demonstrate a clear transition from n-type to p-type with increasing doping levels, placing them among the well-performing p-type MoS2 films reported to date. A thermodynamic-kinetic model is developed to simulate the substitution behavior of Nb atoms on the MoS2 surface, revealing a clear doping correlation governed by growth temperature and precursor pressure, and offering theoretical guidance for optimizing substitution efficiency. This study represents a significant advancement in fabricating scalable, wafer-scale 2D materials with controllable doping, paving the way for the integration of TMDCs into next-generation low-power, flexible, and transparent electronics. Achieving stable p-type doping in MoS₂ is crucial for enabling complementary logic circuits but remains substantially more challenging than n-type doping. Here, the authors demonstrate metal-organic chemical vapor deposition growth of wafer-scale Nb-doped MoS₂ films with uniform p-type behavior, offering a thermodynamic-kinetic model for doping control, thereby advancing scalable 2D materials for low-power, flexible electronics.

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Journal
Communications Materials
Published
2026-01-08
DOI
https://doi.org/10.1038/s43246-025-01065-x
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
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article

Wafer-scale P-type MoS2 monolayers achieved via controllable niobium doping in metal-organic chemical vapor deposition

Ruoyu Zhong, J. Lu, Mengjiao Li, Zhiwei Yao et al.
Communications Materials
2D Materials and Applications
article

Wafer-scale P-type MoS2 monolayers achieved via controllable niobium doping in metal-organic chemical vapor deposition

Ruoyu Zhong, J. Lu, Mengjiao Li, Zhiwei Yao, Tan Luo, Lei Zhang, Le Zheng, Jing Zhang, Jianhua Zhang, Yuming Chen, Zhenyu Wang, Yiou Huang, Zheng Zhu
article en

Abstract

Molybdenum disulfide (MoS2), a prominent two-dimensional (2D) transition metal dichalcogenide (TMDC), offers significant potential for next-generation nanoelectronic and optoelectronic devices due to its tunable electronic properties and atomic-scale thickness. While n-type MoS2 has been extensively studied, achieving stable p-type MoS2 is equally critical for enabling complementary logic circuits and complementary metal-oxide-semiconductor (CMOS) technology based on 2D materials. However, p-type doping in MoS2 remains challenging due to difficulties in achieving uniform, scalable doping with precise control over electronic properties. In this work, we demonstrate the metal-organic chemical vapor deposition (MOCVD) growth of wafer-scale Nb-doped MoS2 films with substitutional incorporation of Nb atoms, achieving uniform p-type behavior with precise doping control. Our Nb-doped MoS2 films demonstrate a clear transition from n-type to p-type with increasing doping levels, placing them among the well-performing p-type MoS2 films reported to date. A thermodynamic-kinetic model is developed to simulate the substitution behavior of Nb atoms on the MoS2 surface, revealing a clear doping correlation governed by growth temperature and precursor pressure, and offering theoretical guidance for optimizing substitution efficiency. This study represents a significant advancement in fabricating scalable, wafer-scale 2D materials with controllable doping, paving the way for the integration of TMDCs into next-generation low-power, flexible, and transparent electronics. Achieving stable p-type doping in MoS₂ is crucial for enabling complementary logic circuits but remains substantially more challenging than n-type doping. Here, the authors demonstrate metal-organic chemical vapor deposition growth of wafer-scale Nb-doped MoS₂ films with uniform p-type behavior, offering a thermodynamic-kinetic model for doping control, thereby advancing scalable 2D materials for low-power, flexible electronics.

Communications MaterialsVol. 7(1)
Shanghai University (CN), Chinese Academy of Sciences (CN), Institute of Semiconductors (CN), University of Chinese Academy of Sciences (CN)
Natural Science Foundation of Shanghai, National Natural Science Foundation of China, National Key Research and Development Program of China
Openalex Percentile: Top 94%
2D Materials and Applications
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