Laser protection thin film compatible with multiband stealth based on metal–dielectric structure

Here, we demonstrate a multifunctional composite thin film based on metal-dielectric structure that simultaneously achieves visible transparency, infrared camouflage, and high-power laser protection. The inner side adopts an alternating stack of high- and low-refractive-index materials. Combined with a metal layer and outer dielectric layers, the structure utilizes optical interference to achieve a visible transmittance of 80.9%, while the structure achieves an emissivity as low as 5.9% primarily via metallic reflection. The dielectric multilayer composed of Ta<sub>2</sub>O<sub>5</sub> and SiO<sub>2</sub> possesses a high laser damage threshold and continues to provide protection even after the outer layers are ablated. Under 1500 W/cm<sup>2</sup> laser irradiation for 120 s, the thin film exhibits exceptional damage resistance. This integrable solution offers significant potential for military optical windows, protection, and stealth system applications.

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Publication Details

Journal
Optics Letters
Published
2026-01-07
DOI
https://doi.org/10.1364/ol.581346
Primary Topic
Laser Material Processing Techniques
Type
article
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article

Laser protection thin film compatible with multiband stealth based on metal–dielectric structure

Z. J. Chen, Mingyun Li, Xiaotan Ji, Zhengqian Luo et al.
Optics Letters
Laser Material Processing Techniques
article

Laser protection thin film compatible with multiband stealth based on metal–dielectric structure

Z. J. Chen, Mingyun Li, Xiaotan Ji, Zhengqian Luo, Yi Lu, Nan Chen, Tong Yang, Haotong Wang, Yikun Bu Yikun Bu, Min Lü, Yuheng Jin
article en

Abstract

Here, we demonstrate a multifunctional composite thin film based on metal-dielectric structure that simultaneously achieves visible transparency, infrared camouflage, and high-power laser protection. The inner side adopts an alternating stack of high- and low-refractive-index materials. Combined with a metal layer and outer dielectric layers, the structure utilizes optical interference to achieve a visible transmittance of 80.9%, while the structure achieves an emissivity as low as 5.9% primarily via metallic reflection. The dielectric multilayer composed of Ta<sub>2</sub>O<sub>5</sub> and SiO<sub>2</sub> possesses a high laser damage threshold and continues to provide protection even after the outer layers are ablated. Under 1500 W/cm<sup>2</sup> laser irradiation for 120 s, the thin film exhibits exceptional damage resistance. This integrable solution offers significant potential for military optical windows, protection, and stealth system applications.

Optics LettersVol. 51(3)
United Microelectronics (United States) (US)
Openalex Percentile: Top 95%
Laser Material Processing Techniques
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