Direct Ink Writing of Tungsten Planar Patterns by Extrusion-based Dispensing System

We present an extrusion-based dispensing system designed for the planar patterning of tungsten ink through direct ink writing. This system achieves uniform ink deposition by precisely controlling the dispensing pressure and the motion of the substrate along predefined writing paths. To assess the impact of pressure on pattern geometry, we fabricated line patterns under various pressure conditions and analyzed their widths and thicknesses. To gain further control over pattern width, we employed an adjacent line overlapping strategy, where several lines, each approximately 200 μm wide, were written with partial overlap. We quantitatively verified the relationship between the number of adjacent lines and the resulting pattern width. This method was also adapted to create planar patterns with complex geometries, including variable widths, curved paths, and discontinuous features. The resulting patterns demonstrated uniform quality and precision. These findings confirm that our proposed system provides a versatile solution for fabricating planar conductive patterns with intricate geometries, suitable for applications in printed electronics and interconnects.

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Publication Details

Journal
Journal of the Korean Society for Precision Engineering
Published
2026-01-01
DOI
https://doi.org/10.7736/jkspe.025.089
Primary Topic
Nanomaterials and Printing Technologies
Type
article
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article

Direct Ink Writing of Tungsten Planar Patterns by Extrusion-based Dispensing System

Sejin Choi, J K Park, M K Lee, Jae-Wook Yu et al.
Journal of the Korean Society for Precision Engineering
Nanomaterials and Printing Technologies
article

Direct Ink Writing of Tungsten Planar Patterns by Extrusion-based Dispensing System

Sejin Choi, J K Park, M K Lee, Jae-Wook Yu, Gil-Yong Lee, Hyuk-Chun Kwon, In-Gu Choi, Ho-Chang Lee, Seong-Uk Oh, Seung-Gon Choi
article en

Abstract

We present an extrusion-based dispensing system designed for the planar patterning of tungsten ink through direct ink writing. This system achieves uniform ink deposition by precisely controlling the dispensing pressure and the motion of the substrate along predefined writing paths. To assess the impact of pressure on pattern geometry, we fabricated line patterns under various pressure conditions and analyzed their widths and thicknesses. To gain further control over pattern width, we employed an adjacent line overlapping strategy, where several lines, each approximately 200 μm wide, were written with partial overlap. We quantitatively verified the relationship between the number of adjacent lines and the resulting pattern width. This method was also adapted to create planar patterns with complex geometries, including variable widths, curved paths, and discontinuous features. The resulting patterns demonstrated uniform quality and precision. These findings confirm that our proposed system provides a versatile solution for fabricating planar conductive patterns with intricate geometries, suitable for applications in printed electronics and interconnects.

Journal of the Korean Society for Precision EngineeringVol. 43(1)
Kumoh National Institute of Technology (KR), Eaton (United States) (US)
Quality Education
Openalex Percentile: Top 96%
Nanomaterials and Printing Technologies
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