Air-stable single-source CVD of ThO2 thin films

Thorium dioxide (ThO 2 ) is gaining increasing technological relevance for next-generation nuclear and advanced functional material applications. These fields demand simple, safe and cost-effective methods for producing high-quality and compositionally uniform ThO 2 coatings. In this work, we present a practical and user-friendly chemical vapor deposition (CVD) process that utilizes air-stable thorium acetylacetonate [Th(acac) 4 ] as a single-source precursor. The resulting ThO 2 films exhibit excellent phase purity and crystallinity, as well as uniform substrate coverage after calcination. This approach offers a safer and simplified alternative to previously reported routes, making a significant step toward scalable processing of actinide-based thin films. • Air-compatible low-pressure MOCVD of ThO 2 thin films demonstrated. • Uses air-stable Th(IV) acetylacetonate as single-source precursor. • Simplified CVD process avoids inert handling and complex setups. • Films show phase purity, smooth morphology, and uniform thickness.